Polymorphs of Neodymium Niobate and Tantalate Thin Films Prepared by Sol-Gel Method

Q4 Materials Science
H. Brunckova, Ľ. Medvecký, E. Múdra, A. Kovalčíková
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引用次数: 2

Abstract

Abstract Neodymium niobate NdNbO4 (NNO) and tantalate NdTaO4 (NTO) thin films (~100 nm) were prepared by sol-gel/spin-coating process on Pb(Zr0.52Ti0.48)O3/Al2O3 substrates with annealing at 1000°C. The precursors of films were synthesized using Nb or Ta tartrate complexes. The XRD results of NNO and NTO films confirmed tetragonal T-NdNbO4 and T-NdTaO4 phases, respectively, with traces of monoclinic MNdNbO4 and M´-NdTaO4. The surface morphology and topography were investigated by SEM and AFM analysis. NTO was smoother with roughness 5.24 nm in comparison with NNO (6.95 nm). In the microstructure of NNO, small spherical (~ 20-50 nm) T-NdNbO4 and larger needle-like particles (~100 nm) of M-NdNbO4 phase were observed. The compact clusters composed of fine spherical T-NdTaO4 particles (~ 50 nm) and cuboidal M´-NdTaO4 particles (~ 100 nm) were found in NTO. The results of this work can contribute to formation of different polymorphs of films for the application in environmental electrolytic thin film devices.
Sol-Gel法制备铌钽酸钕薄膜的多晶型
摘要:在Pb(Zr0.52Ti0.48)O3/Al2O3衬底上,经1000℃退火,采用溶胶-凝胶/旋涂法制备了铌酸钕NdNbO4 (NNO)和钽酸NdTaO4 (NTO)薄膜(~100 nm)。采用酒石酸钠或酒石酸钠配合物合成了薄膜前驱体。NNO膜和NTO膜的XRD结果分别证实了T-NdNbO4和T-NdTaO4的四方相,并有微量的单斜MNdNbO4和M´-NdTaO4。采用扫描电镜(SEM)和原子力显微镜(AFM)对其表面形貌和形貌进行了研究。NTO的粗糙度为5.24 nm, NNO的粗糙度为6.95 nm。在NNO的微观结构中,观察到T-NdNbO4的小球形(~ 20 ~ 50 nm)和M-NdNbO4相较大的针状颗粒(~100 nm)。在NTO中发现了细小的球形T-NdTaO4颗粒(~ 50 nm)和立方M´-NdTaO4颗粒(~ 100 nm)组成的致密团簇。本研究结果有助于形成不同的多晶薄膜,用于环境电解薄膜器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Powder Metallurgy Progress
Powder Metallurgy Progress Materials Science-Metals and Alloys
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