Magnetic Properties In FeNi Thin Films

Abstract

Thin FeNi films with varying thicknesses were fabricated via electrodeposition, and their magnetic properties were investigated using isothermal remanent magnetization (IRM) and direct current demagnetization (DCD) techniques. The interaction coefficient α of the thin FeNi films was determined, and the influence of the dipolar field on the hysteresis loop of the films was examined. The dipolar interaction field was obtained from the IRM and DCD remanence curves, and the magnetic interactions were studied using the ∆M plot.