Silicon Prismanes: Calculation And Comparison Of Heats Of Formation

Q3 Chemical Engineering
E. Zauer, Alexander B. Ershov
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引用次数: 0

Abstract

The objects of this work are silicon prismanes - new high-energy materials that can be used in various electronic, optoelectronic, thermoelectric, and biological fields and compete with traditional chemical energy carriers. However, only compounds with hexasilacubane and octasilacubane have been synthesized to date. Synthesis of other silapismanes, and even more so polysilaprismanes, has not yet been achieved. Therefore, both the “simplest” and the highest silaprismanes are studied mainly theoretically, including by quantum chemistry methods. to expand information about the enthalpies of formation of "simple" (n=2) and multilayer (n=3–7) silicon prismanes using semi-empirical calculation methods; bond lengths Si-Si and Si-H; compare them with the results of ab initio calculations already available in the literature. The geometry was optimized by semi-empirical methods, the enthalpies of formation, Si-Si and Si-H bond lengths, and the bond angles of the bilayer (m = 3 - 12) and some multilayer (n = 3 - 8 and m = 3 - 9) silaprismanes were determined. Comparison with the enthalpies of formation obtained using ab initio calculations shows that the enthalpies of formation obtained by the MINDO / 3 method (Modified Intermediate Neglect of Differential Overlap, version 3) are closest to the results of ab initio calculations of two-layer silicon prismanes; and for multi-layers - by the AM1 method (Austin Model 1). Large differences in the lengths of Si-H bonds determined ab initio and semi-empirically by both methods are not observed. As for the Si-Si bonds, the results of semi-empirical methods indicate the presence of the so-called auxetic effect in multilayer silaprismanes. We believe that in the future, the calculations carried out in this work and a comparative assessment of the enthalpies of formation obtained by calculation methods will help to overcome the problems associated with the synthesis of silicon prismanes.
硅棱镜:生成热的计算和比较
本工作的对象是硅棱镜——一种新型高能材料,可用于各种电子、光电、热电和生物领域,与传统的化学能载体竞争。然而,迄今为止,仅合成了六西古巴和八西古巴的化合物。合成其他硅吡喃酮,甚至更多的硅吡喃酮,还没有实现。因此,无论是“最简单”的西普利曼还是最高的西普利曼,主要都是通过理论研究,包括量子化学方法。利用半经验计算方法扩展“简单”(n=2)和多层(n= 3-7)硅棱镜的生成焓信息;键长Si-Si和Si-H;将它们与文献中已有的从头计算结果进行比较。采用半经验方法对结构进行优化,测定了双分子层(m = 3 ~ 12)和部分多层(n = 3 ~ 8和m = 3 ~ 9)硅吡喃酮的生成焓、Si-Si键长和Si-H键长以及键角。与从头算得到的生成焓比较表明,MINDO / 3方法(Modified Intermediate Neglect of Differential Overlap, version 3)得到的生成焓与两层硅棱镜的从头算结果最接近;对于多层-通过AM1方法(Austin模型1)。两种方法从头算和半经验测定的Si-H键长度没有观察到很大差异。对于Si-Si键,半经验方法的结果表明,在多层西普利斯曼中存在所谓的auxetic效应。我们相信,在未来,在这项工作中进行的计算和通过计算方法获得的生成焓的比较评估将有助于克服与硅棱镜合成相关的问题。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Recent Innovations in Chemical Engineering
Recent Innovations in Chemical Engineering Chemical Engineering-Chemical Engineering (all)
CiteScore
2.10
自引率
0.00%
发文量
20
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