Xiumei Zhu, H. Qi, Jiahao Chen, Jiangbin Su, Zuming He, B. Tang
{"title":"Effects of deposition parameters on RF-sputtered WO3 thin films","authors":"Xiumei Zhu, H. Qi, Jiahao Chen, Jiangbin Su, Zuming He, B. Tang","doi":"10.1680/jsuin.22.01031","DOIUrl":null,"url":null,"abstract":"In the absence of additional oxygen, thin films of tungsten oxide (WO3) were prepared on ITO conductive glass substrates by radio-frequency (RF) magnetron sputtering. The effects of sputtering power, working air pressure, substrate bias voltage and substrate temperature on the surface morphology, microstructure, optical properties and electrochromic (EC) performance of the films were systematically investigated. The research shows that the sputtering power of 80-100 W can ensure a moderate deposition rate of ∼10−2 nm/s and help to obtain nondense films. Similarly, the working air pressure of 1.0 Pa also leads to the deposition of loose films, which benifits for the improving of optical transmittance and EC performance of WO3 thin films. The applied substrate bias has little effect on the optical properties, but it will degrade the coloring and/or bleaching efficiency of WO3 thin films and greatly reduce their optical modulation. When the substrate temperature rises to 600 °C, the film begins to crystallize and exhibits a rods-patterned porous structure, which leads to a small increase in the optical modulation.","PeriodicalId":22032,"journal":{"name":"Surface Innovations","volume":null,"pages":null},"PeriodicalIF":2.7000,"publicationDate":"2022-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface Innovations","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1680/jsuin.22.01031","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 3
Abstract
In the absence of additional oxygen, thin films of tungsten oxide (WO3) were prepared on ITO conductive glass substrates by radio-frequency (RF) magnetron sputtering. The effects of sputtering power, working air pressure, substrate bias voltage and substrate temperature on the surface morphology, microstructure, optical properties and electrochromic (EC) performance of the films were systematically investigated. The research shows that the sputtering power of 80-100 W can ensure a moderate deposition rate of ∼10−2 nm/s and help to obtain nondense films. Similarly, the working air pressure of 1.0 Pa also leads to the deposition of loose films, which benifits for the improving of optical transmittance and EC performance of WO3 thin films. The applied substrate bias has little effect on the optical properties, but it will degrade the coloring and/or bleaching efficiency of WO3 thin films and greatly reduce their optical modulation. When the substrate temperature rises to 600 °C, the film begins to crystallize and exhibits a rods-patterned porous structure, which leads to a small increase in the optical modulation.
Surface InnovationsCHEMISTRY, PHYSICALMATERIALS SCIENCE, COAT-MATERIALS SCIENCE, COATINGS & FILMS
CiteScore
5.80
自引率
22.90%
发文量
66
期刊介绍:
The material innovations on surfaces, combined with understanding and manipulation of physics and chemistry of functional surfaces and coatings, have exploded in the past decade at an incredibly rapid pace.
Superhydrophobicity, superhydrophlicity, self-cleaning, self-healing, anti-fouling, anti-bacterial, etc., have become important fundamental topics of surface science research community driven by curiosity of physics, chemistry, and biology of interaction phenomenon at surfaces and their enormous potential in practical applications. Materials having controlled-functionality surfaces and coatings are important to the manufacturing of new products for environmental control, liquid manipulation, nanotechnological advances, biomedical engineering, pharmacy, biotechnology, and many others, and are part of the most promising technological innovations of the twenty-first century.