P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography

Abstract

Our method for side‐by‐side OLED layer patterning by photolithographic etching offers devices with properties almost equivalent to those of devices consistently fabricated in vacuum. We fabricate herein a 3207‐ppi 1.50‐in low‐power OLED microdisplay with an ultrahigh aperture ratio and no lateral leakage using this method.