M. Nakada, M. Jincho, Masayoshi Dobashi, Takahiro Iguchi, Y. Shima, J. Koezuka, K. Okazaki, Koji Kusunoki, S. Yamazaki
{"title":"43‐4: Ultra‐High On‐Current Vertical Field‐Effect Transistor with Submicron Channel Length of 0.5 µm Using CAAC‐IGZO","authors":"M. Nakada, M. Jincho, Masayoshi Dobashi, Takahiro Iguchi, Y. Shima, J. Koezuka, K. Okazaki, Koji Kusunoki, S. Yamazaki","doi":"10.1002/sdtp.16635","DOIUrl":null,"url":null,"abstract":"In this study, an oxide semiconductor vertical field‐effect transistor (VFET) was developed and VFETs with a channel length of 0.5 mm on a glass substrate with small variation were successfully fabricated. This technology enables displays to have high resolution and low power consumption compared with the use of low‐temperature polysilicon.","PeriodicalId":91069,"journal":{"name":"Digest of technical papers. SID International Symposium","volume":" ","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of technical papers. SID International Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1002/sdtp.16635","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, an oxide semiconductor vertical field‐effect transistor (VFET) was developed and VFETs with a channel length of 0.5 mm on a glass substrate with small variation were successfully fabricated. This technology enables displays to have high resolution and low power consumption compared with the use of low‐temperature polysilicon.