Application of Fourier Optics to Defect Inspection of Display Substrates

Abstract

A method for inspecting defects in display substrates utilizing Fourier optics is proposed in this paper. A cost-effective inspection system can be realized with the proposed method, because it does not require a high-magnification microscope. Also, the proposed method can avoid tight tolerance for variations in displacement between substrate and camera, which is stems from shallow depth of field of the high-magnification microscope. In addition, possible damage caused by collisions between substrate and the inspection equipment can be avoided. The decision algorithm can be simpler than for a conventional inspection system, because spatial shift of periodic substrate patterns does not affect the intensity distribution of the diffracted light, by the Fourier transform property. The proposed method is explained with numerical studies, and experiments are carried out to check its feasibility for color-filter substrates of a liquid-crystal display.