The effect of molybdenum (Mo) concentrations on the mechanical and magnetic properties of electrodeposited Co rich ternary CoMoW thin films from citrate electrolytic bath

IF 1 4区 材料科学
S. Ananthi, T. S. Senthil, R. Sengodan, R. Kannan
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Abstract

Cobalt–Molybdenum-Tungsten (CoMoW) alloy thin films were prepared through an induced electroplating route from a citrate bath on the surface of the copper electrode at the controlled value of pH 8. The CoMoW thin films have been prepared by varying the Mo concentrations like 0.1, 0.2, 0.3 and 0.4 M at a deposition time of 30 minutes over a plating current potential of 40 mA / cm2. The electrodeposited CoMoW coatings have been investigated with the help of Field Emission Scanning Electron Microscopy (FESEM), powder crystal X-ray diffraction (XRD), Electrochemical studies (impedance and polarization) and Vibrating Sample Magnetometer (VSM) to reveal its respective microstructure-based information, mechanical and soft magnetic nature of the synthesized CoMoW thin layers. The CoMoW thin films of an HCP crystal structure have been attained. The induced electroplated condition such as Mo concentration has a significant impact on the crystal structure system, surface morphology, and soft magnetic performances. The crystalline size of the CoMoW thin layers has varied from 22.66 nm to 42.87 nm. The synthesized CoMoW thin layers were smooth, without cracks and had uniform morphology. All the electroplated CoMoW films have the highest Co content along with low Mo content (Co content gradually decreased while increasing the Mo content in the deposits) and thickness varied from 10 to 20 μm. Through the electrochemical investigation studies, it is concluded that the corrosion rate of CoMoW thin films was slightly increased by increasing the Mo content and the corrosion resistance varied from 80.2 KΩ to 92.7 KΩ. The CoMoW thin alloy films with higher Co content exhibited a lower coercivity value of 3.69 Oe and the saturation magnetization of 49.049 emu /cm2.
钼(Mo)浓度对柠檬酸盐电解液中电沉积富Co三元CoMoW薄膜机械性能和磁性能的影响
在pH控制值为8的条件下,通过柠檬酸盐镀液在铜电极表面感应电镀制备了钴钼钨(CoMoW)合金薄膜。在40 mA / cm2的电势下,通过改变Mo浓度为0.1、0.2、0.3和0.4 M,沉积时间为30分钟,制备了CoMoW薄膜。利用场发射扫描电镜(FESEM)、粉末晶体x射线衍射(XRD)、电化学研究(阻抗和极化)和振动样品磁强计(VSM)对电沉积的CoMoW涂层进行了研究,揭示了其各自的微结构信息、合成的CoMoW薄层的机械和软磁性质。获得了具有HCP晶体结构的CoMoW薄膜。Mo浓度等诱导电镀条件对晶体结构体系、表面形貌和软磁性能有显著影响。CoMoW薄层的晶粒尺寸从22.66 nm到42.87 nm不等。合成的CoMoW薄层光滑,无裂纹,形貌均匀。CoMoW镀层Co含量最高,Mo含量较低(随着镀层中Mo含量的增加,Co含量逐渐降低),镀层厚度在10 ~ 20 μm之间变化。通过电化学研究得出,随着Mo含量的增加,CoMoW薄膜的腐蚀速率略有提高,耐蚀性能在80.2 KΩ ~ 92.7 KΩ之间变化。Co含量较高的CoMoW合金薄膜矫顽力值较低,为3.69 Oe,饱和磁化强度为49.049 emu /cm2。
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来源期刊
Journal of Ovonic Research
Journal of Ovonic Research Materials Science-Electronic, Optical and Magnetic Materials
CiteScore
1.60
自引率
20.00%
发文量
77
期刊介绍: Journal of Ovonic Research (JOR) appears with six issues per year and is open to the reviews, papers, short communications and breakings news inserted as Short Notes, in the field of ovonic (mainly chalcogenide) materials for memories, smart materials based on ovonic materials (combinations of various elements including chalcogenides), materials with nano-structures based on various alloys, as well as semiconducting materials and alloys based on amorphous silicon, germanium, carbon in their various nanostructured forms, either simple or doped/alloyed with hydrogen, fluorine, chlorine and other elements of high interest for applications in electronics and optoelectronics. Papers on minerals with possible applications in electronics and optoelectronics are encouraged.
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