Simultaneous Evaluation of Heat Capacity and In-plane Thermal Conductivity of Nanocrystalline Diamond Thin Films

IF 2.7 3区 工程技术 Q2 ENGINEERING, MECHANICAL
Luke Yates, Zhe Cheng, T. Bai, K. Hobart, M. Tadjer, T. Feygelson, B. Pate, M. Goorsky, S. Graham
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引用次数: 3

Abstract

ABSTRACT As wide bandgap electronic devices have continued to advance in both size reduction and power handling capabilities, heat dissipation has become a significant concern. To mitigate this, chemical vapor deposited (CVD) diamond has been demonstrated as an effective solution for thermal management of these devices by directly growing onto the transistor substrate. A key aspect of power and radio frequency (RF) electronic devices involves transient switching behavior, which highlights the importance of understanding the temperature dependence of a material’s heat capacity and thermal conductivity when modeling and predicting a devices electro-thermal response. Due to the complicated microstructure near the interface between CVD diamond and electronic material, it is difficult to measure both properties simultaneously. In this work, we use time-domain thermoreflectance (TDTR) to simultaneously measure the in-plane thermal conductivity and heat capacity of a 1-µm-thick CVD diamond film via multi-frequency analysis. We obtain temperature dependent thermal properties by using the pump beam to heat the sample according to increasing power. This mitigates the need for a more complicated setup using a thermal stage but has limited upper temperature boundaries based on the sample geometry and thermal properties. The results show that the in-plane thermal conductivity varied slightly with an average of 103 W/m-K over a temperature range of 302–327 K, while the specific heat capacity has a strong temperature dependence over the same range and compares well with heat capacity data of natural diamond in literature.
纳米晶金刚石薄膜的热容和面内热导率的同时评价
摘要随着宽带隙电子器件在尺寸减小和功率处理能力方面的不断进步,散热已成为一个重要的问题。为了缓解这种情况,化学气相沉积(CVD)金刚石已被证明是通过直接生长在晶体管衬底上对这些器件进行热管理的有效解决方案。功率和射频(RF)电子设备的一个关键方面涉及瞬态开关行为,这突出了在建模和预测设备电热响应时理解材料热容和热导率的温度依赖性的重要性。由于CVD金刚石与电子材料界面附近的微观结构复杂,很难同时测量这两种性质。在这项工作中,我们使用时域热反射率(TDTR)通过多频率分析同时测量了1µm厚CVD金刚石膜的平面内热导率和热容。我们通过使用泵束根据功率的增加来加热样品,从而获得与温度相关的热性能。这减少了使用热载物台进行更复杂设置的需要,但基于样品几何形状和热特性,具有有限的上温度边界。结果表明,在302–327 K的温度范围内,平面内热导率略有变化,平均值为103 W/m-K,而比热容在相同范围内具有很强的温度依赖性,与文献中天然金刚石的热容数据比较良好。
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来源期刊
Nanoscale and Microscale Thermophysical Engineering
Nanoscale and Microscale Thermophysical Engineering 工程技术-材料科学:表征与测试
CiteScore
5.90
自引率
2.40%
发文量
12
审稿时长
3.3 months
期刊介绍: Nanoscale and Microscale Thermophysical Engineering is a journal covering the basic science and engineering of nanoscale and microscale energy and mass transport, conversion, and storage processes. In addition, the journal addresses the uses of these principles for device and system applications in the fields of energy, environment, information, medicine, and transportation. The journal publishes both original research articles and reviews of historical accounts, latest progresses, and future directions in this rapidly advancing field. Papers deal with such topics as: transport and interactions of electrons, phonons, photons, and spins in solids, interfacial energy transport and phase change processes, microscale and nanoscale fluid and mass transport and chemical reaction, molecular-level energy transport, storage, conversion, reaction, and phase transition, near field thermal radiation and plasmonic effects, ultrafast and high spatial resolution measurements, multi length and time scale modeling and computations, processing of nanostructured materials, including composites, micro and nanoscale manufacturing, energy conversion and storage devices and systems, thermal management devices and systems, microfluidic and nanofluidic devices and systems, molecular analysis devices and systems.
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