Optical and electrical properties of Nd-doped ZnO films prepared by sol-gel method

Q3 Engineering
H. He, Zuoli He, Q. Shen
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引用次数: 0

Abstract

ZnO films doped with Nd contents of 0%-0.81% were deposited by a chemical solution deposition and characterised by X-ray diffraction, field emission scanning electron microscopy, UV-vis and luminescent spectrophotometry and electrical measurement. The experiments revealed that the films have nano-scale particle size that increased with increasing Nd content. The Nd doping resulted in the obvious variations of transmittance in the UV-visible light range, the band gap and resistivity. Thin film showed an optimal optical and electrical properties at Nd content of 0.42%. The films also showed a strong band gap emission and a very weak emission related to intrinsic defect.
溶胶-凝胶法制备nd掺杂ZnO薄膜的光学和电学性质
采用化学溶液沉积法制备了Nd含量为0% ~ 0.81%的ZnO薄膜,并用x射线衍射、场发射扫描电镜、紫外-可见和发光分光光度法以及电测量对其进行了表征。实验结果表明,随着钕含量的增加,薄膜具有纳米级的粒径。Nd的掺入使其在紫外-可见光范围内的透过率、带隙和电阻率发生了明显的变化。当Nd含量为0.42%时,薄膜具有最佳的光学和电学性能。薄膜还表现出较强的带隙发射和与本征缺陷相关的极弱发射。
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来源期刊
International Journal of Nanomanufacturing
International Journal of Nanomanufacturing Engineering-Industrial and Manufacturing Engineering
CiteScore
0.60
自引率
0.00%
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0
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