Modification of Silicon Nanostructures by Cold Atmospheric Pressure Plasma Jets

IF 0.5 Q4 CHEMISTRY, MULTIDISCIPLINARY

Eurasian Chemico-Technological Journal Pub Date : 2023-07-15 DOI:10.18321/ectj1497

N. Pokryshkin, V. G. Yakunin, A. Efimova, A.A. Elyseev, D. Presnov, V. Savinov, V. Timoshenko

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引用次数: 0

Abstract

Cold atmospheric plasma (CAP) jets with helium (He) and argon (Ar) plasma-forming gases were used to modify the structure, photoluminescence (PL), and electrical properties of arrays of silicon nanowires (SiNWs) with initial cross-section sizes of the order of 100 nm and length of about 7‒8 microns. The CAP source consisted of a 30 kHz voltage generator with a full power up to 5 W and the CAP treatment for 1‒5 min resulted in spattering of SiNWs’ tips followed by redeposition of silicon atoms. An increase of the silicon oxide phase and a decrease of the PL intensity were observed in the plasma processed SiNW arrays. A decrease of the free hole concentration and an increase in the free electron density were revealed in heavily boron and phosphorous doped SiNWs, respectively, as it was monitored by means of the Raman spectroscopy, considering a coupling of the light scattering by phonon and free charge carriers (Fano effect) in SiNWs. The obtained results demonstrate that the CAP treatment can be used to change the length, sharpness, luminescence intensity, and electrical properties of silicon nanowires for possible applications in optoelectronics and sensorics.

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冷气压等离子体射流对硅纳米结构的改性

利用氦(He)和氩(Ar)等离子体形成气体的冷大气等离子体(CAP)射流，对初始截面尺寸为100 nm、长度约为7-8微米的硅纳米线(SiNWs)阵列的结构、光致发光(PL)和电学性能进行了修饰。CAP源由30 kHz电压发生器组成，全功率高达5 W, CAP处理1-5分钟导致SiNWs尖端溅射，然后硅原子再沉积。在等离子体处理的SiNW阵列中，氧化硅相增加，PL强度降低。考虑声子和自由载流子的光散射耦合(法诺效应)，重硼和重磷掺杂SiNWs的自由空穴浓度下降，自由电子密度增加。所得结果表明，CAP处理可用于改变硅纳米线的长度、锐度、发光强度和电学性能，在光电子学和传感器中有可能应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Eurasian Chemico-Technological Journal CHEMISTRY, MULTIDISCIPLINARY-

CiteScore

1.10

自引率

20.00%

发文量

审稿时长

20 weeks

期刊介绍： The journal is designed for publication of experimental and theoretical investigation results in the field of chemistry and chemical technology. Among priority fields that emphasized by chemical science are as follows: advanced materials and chemical technologies, current issues of organic synthesis and chemistry of natural compounds, physical chemistry, chemical physics, electro-photo-radiative-plasma chemistry, colloids, nanotechnologies, catalysis and surface-active materials, polymers, biochemistry.