Stability and microbial toxicity of HfO2 and ZrO2 nanoparticles for photolithography

IF 2 4区材料科学 Q4 GREEN & SUSTAINABLE SCIENCE & TECHNOLOGY

Green Materials Pub Date : 2019-09-12 DOI:10.1680/JGRMA.18.00056

Jorge Gonzalez-Estrella, J. Field, C. Ober, R. Sierra-Alvarez

引用次数: 1

Abstract

Hafnium dioxide (HfO2) and zirconium dioxide (ZrO2) nanoparticles (NPs) have gained attention as components of photoresists for next-generation photolithography. Coating of these NPs with organic l...

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光刻用HfO2和ZrO2纳米颗粒的稳定性和微生物毒性

二氧化铪(HfO2)和二氧化锆(ZrO2)纳米颗粒(NPs)作为下一代光刻技术的光刻胶的组成部分受到了人们的关注。在这些NPs表面涂上有机l…

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来源期刊

Green Materials Environmental Science-Pollution

CiteScore

3.50

自引率

15.80%

发文量

期刊介绍： The focus of Green Materials relates to polymers and materials, with an emphasis on reducing the use of hazardous substances in the design, manufacture and application of products.