Design, characterization and applications of direct current plasma source

IF 1.3 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
A. Atta, A. M. Abdel reheem, H. El-Khabeary
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引用次数: 0

Abstract

In this paper, the construction, and operation of a locally design cold plasma reactor are described. The anode diameter effect is studied in three inner diameters 5 mm, 10 mm, and 15 mm. This effect on the discharge and plasma characteristics is studied using oxygen and argon gases. It was found that the optimum diameter is 10 mm. Moreover, the plasma density and temperature are investigated using a cylindrical Langmuir probe at the optimum diameter. It is found that the electron temperature reaches 1.6 eV and the electron density reaches 2.3x108 cm−3 in the case of oxygen gas. On the other hand the X-ray diffraction (XRD), scanning electron microscope (SEM) and Fourier-transform infrared spectroscopy (FTIR) analysis are used for chractrized the manganese cobalt doped ferrite (Mn0.5Co0.5Fe2O4) nanoparticles sample before and after oxygen plasma irradiation. The obtained results showed that cold plasma reactor is constructed with high efficiency to meet the required applications such as surface modification, plasma deposition and etching.
直流等离子体源的设计、表征及应用
本文介绍了一个局部设计的冷等离子体反应器的结构和操作。研究了三种内径5的阳极直径效应 毫米,10 mm和15 使用氧气和氩气研究这种对放电和等离子体特性的影响。发现最佳直径为10 此外,使用圆柱形Langmuir探针在最佳直径下研究了等离子体密度和温度。发现电子温度达到1.6 eV,电子密度达到2.3x108 在氧气的情况下为cm−3。另一方面,利用X射线衍射(XRD)、扫描电子显微镜(SEM)和傅立叶变换红外光谱(FTIR)对氧等离子体辐照前后的锰钴掺杂铁氧体(Mn0.5Co0.5Fe2O4)纳米颗粒样品进行了表征。结果表明,冷等离子体反应器结构高效,可满足表面改性、等离子体沉积和刻蚀等应用要求。
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来源期刊
Emerging Materials Research
Emerging Materials Research MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
4.50
自引率
9.10%
发文量
62
期刊介绍: Materials Research is constantly evolving and correlations between process, structure, properties and performance which are application specific require expert understanding at the macro-, micro- and nano-scale. The ability to intelligently manipulate material properties and tailor them for desired applications is of constant interest and challenge within universities, national labs and industry.
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