Influence of Bitartrate Ion Concentration in the Copper Electrodeposition Onto a Polycrystalline Gold Electrode

IF 0.7 4区 化学 Q4 CHEMISTRY, MULTIDISCIPLINARY
M. Hernández, G. Álvarez-Romero, M. Rivera, Simplicio González-Montiel, C. H. Rios-Reyes, L. Mendoza-Huizar
{"title":"Influence of Bitartrate Ion Concentration in the Copper Electrodeposition Onto a Polycrystalline Gold Electrode","authors":"M. Hernández, G. Álvarez-Romero, M. Rivera, Simplicio González-Montiel, C. H. Rios-Reyes, L. Mendoza-Huizar","doi":"10.5562/cca3757","DOIUrl":null,"url":null,"abstract":": In the present work, the influence of the concentration of bitartrate ions (HT) on the copper electrodeposition process was analyzed. The study was carried out from an aqueous solution containing 0.001 M of CuX (where X = (NO 3– ) 2 ,(Cl – ) 2 , S O 4 2– ) and x M KHT (where x = 0.005 M, 0.01 M, and 0.015 M). From voltammetric and chronoamperometric studies, the results indicate that copper electrodeposition is a diffusion-controlled process. The current density transients were well described through a kinetic me chanism involving capacitive and faradaic contributions. The diffusion coefficient values of Cu 1+ and Cu 2+ result to be similar at the different concentration values of potassium bitartrate used in this work.","PeriodicalId":10822,"journal":{"name":"Croatica Chemica Acta","volume":null,"pages":null},"PeriodicalIF":0.7000,"publicationDate":"2021-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Croatica Chemica Acta","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.5562/cca3757","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

: In the present work, the influence of the concentration of bitartrate ions (HT) on the copper electrodeposition process was analyzed. The study was carried out from an aqueous solution containing 0.001 M of CuX (where X = (NO 3– ) 2 ,(Cl – ) 2 , S O 4 2– ) and x M KHT (where x = 0.005 M, 0.01 M, and 0.015 M). From voltammetric and chronoamperometric studies, the results indicate that copper electrodeposition is a diffusion-controlled process. The current density transients were well described through a kinetic me chanism involving capacitive and faradaic contributions. The diffusion coefficient values of Cu 1+ and Cu 2+ result to be similar at the different concentration values of potassium bitartrate used in this work.
铜电沉积中酒石酸盐离子浓度对多晶金电极的影响
本文分析了酒石酸盐离子(HT)浓度对铜电沉积过程的影响。该研究是在含有0.001 M CuX(其中X=(NO3-)2、(Cl-)2、S O 4 2-)和X M KHT(其中X=0.005 M、0.01 M和0.015 M)的水溶液中进行的。从伏安法和计时电流法的研究结果表明,铜电沉积是一个扩散控制的过程。通过涉及电容和法拉第贡献的动力学机制,很好地描述了电流密度瞬态。在本工作中使用的酒石酸钾的不同浓度值下,Cu1+和Cu2+的扩散系数值相似。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Croatica Chemica Acta
Croatica Chemica Acta 化学-化学综合
CiteScore
0.60
自引率
0.00%
发文量
3
审稿时长
18 months
期刊介绍: Croatica Chemica Acta (Croat. Chem. Acta, CCA), is an international journal of the Croatian Chemical Society publishing scientific articles of general interest to chemistry.
文献相关原料
公司名称 产品信息 采购帮参考价格
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信