AGNETRON SPUTTERING OF PROTECTIVE COATINGS ON PARTS OF SURFACES OF PRODUCTS AND TOOLS USING MULTIELEMENT TARGETS MANUFACTURED USING A NEW TECHNOLOGY

Q3 Engineering
A. Berdibekov
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引用次数: 0

Abstract

Recently, the use of magnetron sputtering for the deposition of protective coatings has been intensively developed. The great prospect of using this method is due to the possibility ofapplying high-entropy coatings, which are used to protect surfaces that are simultaneously exposed to elevated temperatures, aggressive media and various types of wear. However, the use of the method of creating high-entropy coatings greatly hinders the absence in many cases of the required alloys, which have not only a certain qualitative elemental composition, but also a quantitative one. We managed to solve this problem by creating multi-element targets, with the help of which it becomes possible to create not only almost any elemental composition, but also to regulate the quantitative composition of elements. In this paper, we have proposed a method for manufacturing new types of targets for magnetron sputtering, with a detailed description of the technological chain of their manufacture. The novelty lies in the possibility of applying multi-element coatings when using one target. This is due to the fact that the number of different elements in the target can be measured in tens. The paper also presents the obtained positive result of using a target, which included five different metals, during magnetron sputtering.
使用新技术制造的多元素靶材在产品和工具表面的保护涂层上进行磁控溅射
近年来,利用磁控溅射沉积保护涂层得到了大力发展。使用这种方法的巨大前景是由于应用高熵涂层的可能性,该涂层用于保护同时暴露于高温、侵蚀性介质和各种类型磨损的表面。然而,使用产生高熵涂层的方法极大地阻碍了在许多情况下所需合金的缺乏,这些合金不仅具有一定的定性元素组成,而且具有定量元素组成。我们通过创建多元素靶来解决这个问题,在多元素靶的帮助下,不仅可以创建几乎任何元素组成,还可以调节元素的定量组成。本文提出了一种制造新型磁控溅射靶材的方法,并详细描述了其制造的技术链。新颖之处在于当使用一个靶时可以应用多元素涂层。这是由于目标中不同元素的数量可以用几十来测量。本文还介绍了在磁控溅射过程中使用包括五种不同金属的靶所获得的积极结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
1.10
自引率
0.00%
发文量
15
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