{"title":"Thermal Resistance by Transition Between Collective and Non-Collective Phonon Flows in Graphitic Materials","authors":"Sangyeop Lee, Xun Li, Ruiqiang Guo","doi":"10.1080/15567265.2019.1575497","DOIUrl":null,"url":null,"abstract":"ABSTRACT Phonons in graphitic materials exhibit strong normal scattering (N-scattering) compared to umklapp scattering (U-scattering). The strong N-scattering cause collective phonon flow, unlike the relatively common cases where U-scattering is dominant. If graphitic materials have finite size and contact with hot and cold reservoirs emitting phonons with non-collective distribution, N-scattering change the non-collective phonon flow to the collective phonon flow near the interface between graphitic material and a heat reservoir. We study the thermal resistance by N-scattering during the transition between non-collective and collective phonon flows. Our Monte Carlo solution of Peierls-Boltzmann transport equation shows that the N-scattering in graphitic materials reduce heat flux from the ballistic case by around 15%, 30%, and 40% at 100, 200, and 300 K, respectively. This is significantly larger than ~ 5% reduction of Debye crystal with similar Debye temperature (~2300 K). We associate the large reduction of heat flux by N-scattering with the non-linear dispersion and multiple phonon branches with different group velocities of graphitic materials.","PeriodicalId":49784,"journal":{"name":"Nanoscale and Microscale Thermophysical Engineering","volume":"23 1","pages":"247 - 258"},"PeriodicalIF":2.7000,"publicationDate":"2018-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1080/15567265.2019.1575497","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale and Microscale Thermophysical Engineering","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1080/15567265.2019.1575497","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MECHANICAL","Score":null,"Total":0}
引用次数: 8
Abstract
ABSTRACT Phonons in graphitic materials exhibit strong normal scattering (N-scattering) compared to umklapp scattering (U-scattering). The strong N-scattering cause collective phonon flow, unlike the relatively common cases where U-scattering is dominant. If graphitic materials have finite size and contact with hot and cold reservoirs emitting phonons with non-collective distribution, N-scattering change the non-collective phonon flow to the collective phonon flow near the interface between graphitic material and a heat reservoir. We study the thermal resistance by N-scattering during the transition between non-collective and collective phonon flows. Our Monte Carlo solution of Peierls-Boltzmann transport equation shows that the N-scattering in graphitic materials reduce heat flux from the ballistic case by around 15%, 30%, and 40% at 100, 200, and 300 K, respectively. This is significantly larger than ~ 5% reduction of Debye crystal with similar Debye temperature (~2300 K). We associate the large reduction of heat flux by N-scattering with the non-linear dispersion and multiple phonon branches with different group velocities of graphitic materials.
期刊介绍:
Nanoscale and Microscale Thermophysical Engineering is a journal covering the basic science and engineering of nanoscale and microscale energy and mass transport, conversion, and storage processes. In addition, the journal addresses the uses of these principles for device and system applications in the fields of energy, environment, information, medicine, and transportation.
The journal publishes both original research articles and reviews of historical accounts, latest progresses, and future directions in this rapidly advancing field. Papers deal with such topics as:
transport and interactions of electrons, phonons, photons, and spins in solids,
interfacial energy transport and phase change processes,
microscale and nanoscale fluid and mass transport and chemical reaction,
molecular-level energy transport, storage, conversion, reaction, and phase transition,
near field thermal radiation and plasmonic effects,
ultrafast and high spatial resolution measurements,
multi length and time scale modeling and computations,
processing of nanostructured materials, including composites,
micro and nanoscale manufacturing,
energy conversion and storage devices and systems,
thermal management devices and systems,
microfluidic and nanofluidic devices and systems,
molecular analysis devices and systems.