Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

IF 20.6 1区物理与天体物理 Q1 OPTICS

Advanced Photonics Pub Date : 2022-11-01 DOI:10.1117/1.AP.4.6.066002

Dazhao Zhu, Liang Xu, Chenliang Ding, Zhenyao Yang, Yiwei Qiu, Chun Cao, Hongyang He, Jiawei Chen, Mengbo Tang, Lanxin Zhan, Xiaoyi Zhang, Qiuyuan Sun, Chengpeng Ma, Zhen Wei, Wenjie Liu, Xiang Fu, C. Kuang, Haifeng Li, Xu Liu

引用次数: 6

Abstract

Abstract. Direct laser writing (DLW) enables arbitrary three-dimensional nanofabrication. However, the diffraction limit poses a major obstacle for realizing nanometer-scale features. Furthermore, it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems, which cannot perform high-throughput lithography. To overcome these challenges, a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study, based on two-photon polymerization DLW. The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures. The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.

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基于双焦平行外设光抑制光刻的直接激光写入破衍射势垒

摘要直接激光写入(DLW)可以实现任意三维纳米加工。然而，衍射极限是实现纳米尺度特征的主要障碍。此外，使用目前流行的单焦点光斑系统来提高制造效率是具有挑战性的，这无法实现高通量光刻。为了克服这些挑战，我们在双光子聚合DLW的基础上开发了一个二维特征尺寸低于40纳米、悬浮线宽度低于20纳米的并行外设光抑制光刻系统。对于均匀结构和复杂结构，所开发的系统的光刻效率是传统系统的两倍。该系统有助于实现具有更高分辨率和吞吐量的便携式DLW。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Advanced Photonics OPTICS-

CiteScore

22.70

自引率

1.20%

发文量

审稿时长

18 weeks

期刊介绍： Advanced Photonics is a highly selective, open-access, international journal that publishes innovative research in all areas of optics and photonics, including fundamental and applied research. The journal publishes top-quality original papers, letters, and review articles, reflecting significant advances and breakthroughs in theoretical and experimental research and novel applications with considerable potential. The journal seeks high-quality, high-impact articles across the entire spectrum of optics, photonics, and related fields with specific emphasis on the following acceptance criteria: -New concepts in terms of fundamental research with great impact and significance -State-of-the-art technologies in terms of novel methods for important applications -Reviews of recent major advances and discoveries and state-of-the-art benchmarking. The journal also publishes news and commentaries highlighting scientific and technological discoveries, breakthroughs, and achievements in optics, photonics, and related fields.