Comparing Resistances to Pitting Corrosion of Additive Manufactured Ti-6Al-4V Alloys in NaCl and NaBr Aqueous Solutions, NaCl과 NaBr수용액에서 적층가공으로 제조된 Ti-6Al-4V 합금의 공식 저항성 비교

IF 0.8 Q4 ELECTROCHEMISTRY
D. Seo, Jae-Bong Lee, 서동일, 이재봉
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引用次数: 2

Abstract

Resistances to pitting corrosion of additive manufactured (AM) Ti-6Al-4V alloys in 0.6 M NaBr and 0.6 M NaCl aqueous solutions were compared using micro-droplet cell techniques. With respect to the pitting corrosion resistance, this study focused on two different types of halide anions in aqueous solutions, i.e. Br - and Cl - . The differences between Br - and Cl - halide anions for breakdown on passive films of AM Ti-6Al-4V alloy were explained using Langmuir adsorption model with their equilibrium adsorption coefficients. The results of the analysis showed that the lower resistance to pitting potential of AM Ti-6Al-4V alloy in Br - aqueous solution was attributed to the higher equilibrium adsorption coefficient of Br - . In addition, micro-electrochemical test results showed that the pitting corrosion resistance of dark grains in additive manufactured Ti-6Al-4V alloy was lower as compared to that of bright grains due to the larger volume of α ' phase that caused the susceptibility to pit initiation.
Comparing Resistances to Pitting Corrosion of Additive Manufactured Ti-6Al-4V Alloys in NaCl and NaBr Aqueous Solutions, NaCl与NaBr水溶液中经过层压加工制造的Ti-6Al-4V合金的正式电阻性比较
使用微滴池技术比较了添加剂制造的(AM)Ti-6Al-4V合金在0.6M NaBr和0.6M NaCl水溶液中的耐点蚀性。关于耐点蚀性,本研究重点研究了水溶液中两种不同类型的卤化物阴离子,即Br-和Cl-。利用Langmuir吸附模型及其平衡吸附系数,解释了Br-和Cl-卤化物阴离子在AM Ti-6Al-4V合金钝化膜上击穿的差异。分析结果表明,AM Ti-6Al-4V合金在Br-水溶液中耐点蚀电位较低的原因是Br-的平衡吸附系数较高。此外,微观电化学测试结果表明,与亮晶粒相比,添加剂制造的Ti-6Al-4V合金中暗晶粒的耐点蚀性能较低,这是由于较大体积的α相导致了点蚀的敏感性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
1.30
自引率
66.70%
发文量
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