Electrochemical Growth and Structural Study of the AlxGa1−xAs Nanowhisker Layer on the GaAs Surface

IF 3.3 Q2 ENGINEERING, MANUFACTURING
Y. Suchikova, S. Kovachov, I. Bohdanov, Anar A. Abdikadirova, I. Kenzhina, Anatoli I. Popov
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引用次数: 1

Abstract

This work presents a novel, cost-effective method for synthesizing AlxGa1−xAs nanowhiskers on a GaAs surface by electrochemical deposition. The process begins with structuring the GaAs surface by electrochemical etching, forming a branched nanowhisker system. Despite the close resemblance of the crystal lattices of AlAs, GaAs, and AlxGa1−xAs, our study highlights the formation of nanowhiskers instead of layer-by-layer film growth. X-ray diffraction analysis and photoluminescence spectrum evaluations confirm the synthesized structure’s crystallinity, uniformity, and bandgap characteristics. The unique morphology of the nanowhiskers offers promising implications for solar cell applications because of the increased light absorption potential and reduced surface recombination energy losses. We conclude by emphasizing the need for further studies on the growth mechanisms of AlxGa1−xAs nanowhiskers, adjustments of the “x” parameter during electrochemical deposition, and detailed light absorption properties of the formed compounds. This research contributes to the field of wideband materials, particularly for solar energy applications, highlighting the potential of electrochemical deposition as a flexible and economical fabrication method.
GaAs表面AlxGa1-xAs纳米晶须层的电化学生长及结构研究
本研究提出了一种新颖、经济的方法,通过电化学沉积在GaAs表面合成AlxGa1−xAs纳米晶须。该工艺首先通过电化学蚀刻构造砷化镓表面,形成分支纳米晶须系统。尽管AlAs、GaAs和AlxGa1−xAs的晶格非常相似,但我们的研究强调了纳米晶须的形成,而不是逐层薄膜的生长。x射线衍射分析和光致发光光谱评价证实了合成结构的结晶度、均匀性和带隙特性。纳米晶须的独特形态为太阳能电池的应用提供了很好的前景,因为它增加了光吸收潜力,减少了表面复合能量损失。最后,我们强调需要进一步研究AlxGa1−xAs纳米晶须的生长机制,电化学沉积过程中“x”参数的调整以及形成的化合物的详细光吸收特性。这项研究为宽带材料领域,特别是太阳能应用领域做出了贡献,突出了电化学沉积作为一种灵活而经济的制造方法的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Manufacturing and Materials Processing
Journal of Manufacturing and Materials Processing Engineering-Industrial and Manufacturing Engineering
CiteScore
5.10
自引率
6.20%
发文量
129
审稿时长
11 weeks
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