Corrosion behavior of electrophoretically deposited boron nitride nanosheets on copper

IF 0.1 Q4 ENGINEERING, CHEMICAL
A. Nadeem, M. Raza
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引用次数: 0

Abstract

The prime purpose of this research study is to determine the possibility of corrosion protection offered by boron nitride nanosheets (BNNSs) coated on pure Copper (Cu) strip through electrophoretic deposition (EPD). BNNSs suspension was developed by sonicating hexagonal boron nitride in isopropyl alcohol for 35 h prior to centrifugal partitioning of the supernatant solution, which contained BNNSs having thickness of ca. 11 nm as shown by atomic force microscopy. BNNSs deposition on copper substrate was processed in an EPD electrochemical cell arrangement keeping Cu metal as cathode and platinum as anode. The consequent BNNSs coating on the substrate was critically confirmed through series of microscopies adopting scanning electron, atomic force, and Fourier transform infrared. Energy dispersive x-ray analysis and x-ray diffraction techniques inferred the characterization positively. Tafel analysis and electrochemical impedance spectroscopy both were implied in order to evaluate  the corrosion behavior of coatings developed on substrate copper. The former confirmed an approximate sixfold enhancement in  anti-corrosion capacity of copper protected by BN nanosheets than its bare form. The later, EIS analysis indicated a high impedance and charge transfer resistance ability of BNNSs coatings.
电泳沉积氮化硼纳米片在铜表面的腐蚀行为
本研究的主要目的是确定通过电泳沉积(EPD)涂覆在纯铜(Cu)带上的氮化硼纳米片(BNNSs)提供腐蚀保护的可能性。在离心分配上清液之前,通过在异丙醇中超声处理六方氮化硼35小时来制备BNNSs悬浮液,上清液含有厚度约为11nm的BNNSs,如原子力显微镜所示。在保持Cu金属作为阴极和铂作为阳极的EPD电化学电池布置中,在铜衬底上进行BNNSs沉积。通过采用扫描电子、原子力和傅里叶变换红外的一系列显微镜检查,严格证实了在基底上形成的BNNSs涂层。能量色散x射线分析和x射线衍射技术对表征进行了积极的推断。Tafel分析和电化学阻抗谱都是为了评估在铜基底上开发的涂层的腐蚀行为。前者证实了由BN纳米片保护的铜的抗腐蚀能力比其裸露形式提高了大约六倍。后来的EIS分析表明,BNNSs涂层具有高阻抗和电荷转移电阻能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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