A comparative study of lapping and grinding induced surface/subsurface damage of silicon wafers and corresponding polishing efficiency

Q3 Engineering
Zhiyuan Li, Shang‐lin Gao, R. Kang, Liang Honggang, Xiaoguang Guo
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引用次数: 0

Abstract

The lapping and grinding induced wafers surface damage layers with the same roughness Ra were compared in terms of surface morphology, surface roughness PV, subsurface damage, material removal mech...
研磨与磨削对硅片表面/亚表面损伤的影响及其抛光效率的对比研究
从表面形貌、表面粗糙度PV、亚表面损伤、材料去除机制等方面比较了相同粗糙度Ra的研磨和磨削引起的晶圆表面损伤层。
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来源期刊
International Journal of Abrasive Technology
International Journal of Abrasive Technology Engineering-Industrial and Manufacturing Engineering
CiteScore
0.90
自引率
0.00%
发文量
13
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