Investigating Photochromic Behavior of Organic Dyes in Solution Form using Multilevel Factorial Design
IF 1.3
Q3 ENGINEERING, CHEMICAL
Najiah Nadir, Z. Wahid, A. Shafie, F. Ahmad, M. T. Zainuddin
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Abstract
Photochromic compounds, namely spiropyran, spirooxazine, and naphthopyran, have received much attention, because of their high potential applications in various industrial fields. The aim of this study is to understand the behavior of three photochromic dyes in solution form via statistical approach. The types of dyes and solvents were screened using multilevel factorial design. From the analysis of variance results, it was found that the types of dyes and solvents used as well as their interaction have significant effects on the absorbance and photostability. The naphthopyran compound displayed highest change in absorbance intensity, followed by spiropyran and spirooxazine, when dissolved in isopropanol separately. However, the spirooxazine is the most photostable dye compared to naphthopyran and spiropyran, with ethanol as the solvent. Copyright © 2021 by Authors, Published by BCREC Group. This is an open access article under the CC BY-SA License (https://creativecommons.org/licenses/by-sa/4.0).
用多水平析因设计研究有机染料在溶液形式下的光致变色行为
光致变色化合物,即螺吡喃、螺恶嗪和萘并吡喃,由于其在各种工业领域的高潜力应用而受到广泛关注。本研究的目的是通过统计方法了解三种溶液形式的光致变色染料的行为。采用多级析因设计筛选染料和溶剂的种类。方差分析结果表明,所用染料和溶剂的类型及其相互作用对吸光度和光稳定性有显著影响。萘并吡喃化合物在异丙醇中分别溶解时表现出最高的吸收强度变化,其次是螺吡喃和螺恶嗪。然而,与乙醇为溶剂的萘吡喃和螺吡喃相比,螺恶嗪是最耐光的染料。版权所有©2021作者所有,BCREC集团出版。这是CC BY-SA许可证下的开放访问文章(https://creativecommons.org/licenses/by-sa/4.0)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
来源期刊
期刊介绍:
Bulletin of Chemical Reaction Engineering & Catalysis, a reputable international journal, provides a forum for publishing the novel technologies related to the catalyst, catalysis, chemical reactor, kinetics, and chemical reaction engineering. Scientific articles dealing with the following topics in chemical reaction engineering, catalysis science and engineering, catalyst preparation method and characterization, novel innovation of chemical reactor, kinetic studies, etc. are particularly welcome. However, articles concerned on general chemical engineering process are not covered and out of scope of this journal