Wear of chromium nitride coating under high loads and speeds

IF 1 4区 工程技术 Q4 ENGINEERING, MECHANICAL
S. Singh, S. Chattopadhyaya, A. Pramanik, Sanjeev Kumar, A. Basak
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引用次数: 4

Abstract

This paper investigates the effect of high loads (up to100 N) and high speeds (up to 3 m/s) on wear and friction behaviour of PVD deposited CrN coatings on cast iron substrate. Uncoated substrate materials were also tests under identical test parameters to compare the friction coefficient, wear rate, temperature generation accompanied with wear mechanism. With the increase of normal loads from 50 N to 80 N the wear rate of coated sample increases from 4.59 × 10−5 mm3/Nm to 6.86 × 10−5 mm3/Nm, while the sliding speed remains constant. Temperature rise due to friction was monitored in wear tracks, and higher wear track temperature (from 65°C to 178°C) simulates higher coating wear as well as degradation of materials. The wear mechanisms of the CrN coatings involve pull out of nitride particles, oxidation of wear particles, adhesive wear and a combination of fatigue delamination as evident from wear track morphology investigated by scanning electron microscope.
氮化铬涂层在高负荷和高速度下的磨损
本文研究了高载荷(高达100N)和高速度(高达3m/s)对铸铁基体PVD沉积CrN涂层磨损和摩擦行为的影响。在相同的试验参数下,对未涂覆的基体材料进行了试验,以比较摩擦系数、磨损率、随磨损机理而产生的温度。随着正常载荷从50N增加到80N,涂层样品的磨损率从4.59×10−5 mm3/Nm增加到6.86×10−5mm3/Nm,同时滑动速度保持不变。在磨损轨迹中监测摩擦引起的温度上升,较高的磨损轨迹温度(从65°C到178°C)模拟了较高的涂层磨损和材料退化。扫描电子显微镜研究的磨损轨迹形态表明,CrN涂层的磨损机制包括氮化物颗粒的拉出、磨损颗粒的氧化、粘着磨损和疲劳分层的组合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
1.60
自引率
25.00%
发文量
21
审稿时长
>12 weeks
期刊介绍: IJSurfSE publishes refereed quality papers in the broad field of surface science and engineering including tribology, but with a special emphasis on the research and development in friction, wear, coatings and surface modification processes such as surface treatment, cladding, machining, polishing and grinding, across multiple scales from nanoscopic to macroscopic dimensions. High-integrity and high-performance surfaces of components have become a central research area in the professional community whose aim is to develop highly reliable ultra-precision devices.
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