Electron Beam-Induced Writing of Nanoscale Iron Wires on a Functional Metal Oxide.

Florian Vollnhals, Tom Woolcot, Marie-Madeleine Walz, Steffen Seiler, Hans-Peter Steinrück, Geoff Thornton, Hubertus Marbach
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引用次数: 23

Abstract

Electron beam-induced surface activation (EBISA) has been used to grow wires of iron on rutile TiO2(110)-(1 × 1) in ultrahigh vacuum. The wires have a width down to ∼20 nm and hence have potential utility as interconnects on this dielectric substrate. Wire formation was achieved using an electron beam from a scanning electron microscope to activate the surface, which was subsequently exposed to Fe(CO)5. On the basis of scanning tunneling microscopy and Auger electron spectroscopy measurements, the activation mechanism involves electron beam-induced surface reduction and restructuring.

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电子束诱导在功能金属氧化物上刻写纳米铁丝。
采用电子束诱导表面活化(eebisa)技术,在超高真空条件下在金红石型TiO2(110)-(1 × 1)上生长铁丝。导线的宽度低至~ 20nm,因此作为介电衬底上的互连具有潜在的实用性。利用扫描电子显微镜的电子束来激活表面,然后将其暴露于Fe(CO)5中,从而形成金属丝。通过扫描隧道显微镜和俄歇电子能谱测量,发现其活化机制为电子束诱导的表面还原和重构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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