Evaluation of Various Polishing Systems for Lithium Disilicate Glass-Ceramics.

Y-J Lee, Y-H Huh, K-H Ko, C-J Park, L-R Cho
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Abstract

Objective: The aim of this study was to investigate the surface roughness of lithium disilicates (LS2s) polished using various polishing systems.

Materials and methods: Two types of LS2 (A, Amber Mill and E, IPS e.max CAD) were polished using LS2-specific polishing systems (L-Edenta, L-Jota), a zirconia-specific polishing system (Z-Jota), and a conventional ceramic polishing system (P-Shofu) (n = 8 per group). The compositions of different polishing systems were analyzed using EDS. Surface roughness was measured using confocal laser scanning microscopy and analyzed using EDS and SEM. ANOVA and Tukey's tests were used for the statistical analyses (p = 0.05).

Results: The polishing systems were mainly composed of C, O, and Si. The L-Jota group exhibited rougher surfaces than the other groups. Amber Mill exhibited higher surface roughness than IPS e.max CAD (p⟨0.001). Among the polishing systems, the L-Jota group presented the highest roughness value (pp⟨0.001). The surface roughness of the AL-Jota group was higher than that of the other groups.

Conclusions: A sufficiently smooth surface can be achieved without a LS2-specific polishing system. Further, the same polishing system can have different effects depending on the type of LS2.

二硅酸锂玻璃陶瓷各种抛光系统的评价。
目的:本研究的目的是研究不同抛光系统抛光后的LS2s表面粗糙度。材料和方法:采用LS2专用抛光系统(L-Edenta, L-Jota)、氧化锆专用抛光系统(Z-Jota)和常规陶瓷抛光系统(P-Shofu)对两种LS2 (A, Amber Mill和E, IPS e.max CAD)进行抛光(每组n = 8)。利用能谱仪分析了不同抛光体系的组成。用共聚焦激光扫描显微镜测量表面粗糙度,并用EDS和SEM分析表面粗糙度。统计学分析采用方差分析和Tukey’s检验(p = 0.05)。结果:抛光体系主要由C、O和Si组成。L-Jota组的表面比其他组粗糙。Amber Mill的表面粗糙度高于IPS e.max CAD (p⟨0.001)。在抛光系统中,L-Jota组的粗糙度值最高(pp⟨0.001)。AL-Jota组的表面粗糙度高于其他组。结论:在没有ls2专用抛光系统的情况下,可以获得足够光滑的表面。此外,根据LS2的类型,相同的抛光系统可能具有不同的效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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