{"title":"Production Rates for Oxyfluorides SOF<sub>2</sub>, SO<sub>2</sub>F<sub>2</sub>, and SOF<sub>4</sub> in SF<sub>6</sub> Corona Discharges.","authors":"R J Van Brunt","doi":"10.6028/jres.090.012","DOIUrl":null,"url":null,"abstract":"<p><p>The most abundant, long-lived stable gaseous species generated by corona discharges in SF<sub>6</sub> gas containing trace levels of O<sub>2</sub> and H<sub>2</sub>O are the oxyfluorides SOF<sub>2</sub>, SO<sub>2</sub>F<sub>2</sub>, and SOF<sub>4</sub>. Absolute energy and charge rates-of-production of these and the minor products SO<sub>2</sub>, OCS, and CO<sub>2</sub> have been measured at different total gas pressures from 100 kPa to 300 kPa and for discharges of different current, power, and polarity. Oxyfluoride yields for SF<sub>6</sub>/O<sub>2</sub> mixtures containing up to 10% O<sub>2</sub> have also been measured. The results indicate that oxyfluoride production is not controlled by the concentrations of either O<sub>2</sub> or H<sub>2</sub>O at levels below about 1%, and the rate controlling factor is the dissociation rate of SF<sub>6</sub> in the discharge. The discharge current and time dependence of the production rates are discussed in terms of gas-phase mechanisms that have been proposed to explain previous observations of electrical, thermal, and laser-induced decomposition of SF<sub>6</sub> and SF<sub>6</sub>/O<sub>2</sub> mixtures. Upper limits on the total SF<sub>6</sub> decomposition rate in low-current discharges have been estimated. Details of the chemical analysis procedures are given, and application of the results to the design of chemical diagnostics for SF<sub>6</sub>-insulated, high-voltage apparatus is discussed.</p>","PeriodicalId":93321,"journal":{"name":"Journal of research of the National Bureau of Standards (1977)","volume":"90 3","pages":"229-253"},"PeriodicalIF":0.0000,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6692278/pdf/jres-90-229.pdf","citationCount":"100","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of research of the National Bureau of Standards (1977)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.6028/jres.090.012","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 100
Abstract
The most abundant, long-lived stable gaseous species generated by corona discharges in SF6 gas containing trace levels of O2 and H2O are the oxyfluorides SOF2, SO2F2, and SOF4. Absolute energy and charge rates-of-production of these and the minor products SO2, OCS, and CO2 have been measured at different total gas pressures from 100 kPa to 300 kPa and for discharges of different current, power, and polarity. Oxyfluoride yields for SF6/O2 mixtures containing up to 10% O2 have also been measured. The results indicate that oxyfluoride production is not controlled by the concentrations of either O2 or H2O at levels below about 1%, and the rate controlling factor is the dissociation rate of SF6 in the discharge. The discharge current and time dependence of the production rates are discussed in terms of gas-phase mechanisms that have been proposed to explain previous observations of electrical, thermal, and laser-induced decomposition of SF6 and SF6/O2 mixtures. Upper limits on the total SF6 decomposition rate in low-current discharges have been estimated. Details of the chemical analysis procedures are given, and application of the results to the design of chemical diagnostics for SF6-insulated, high-voltage apparatus is discussed.