Uranium Ion Yields from Monodisperse Uranium Oxide Particles.

IF 1.5 4区工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics Pub Date : 2016-05-01 DOI:10.1116/1.4942612

Nicholas Sharp, John D Fassett, David S Simons

{"title":"Uranium Ion Yields from Monodisperse Uranium Oxide Particles.","authors":"Nicholas Sharp, John D Fassett, David S Simons","doi":"10.1116/1.4942612","DOIUrl":null,"url":null,"abstract":"Secondary ion mass spectrometry (SIMS) plays an important role in nuclear forensics through its ability to identify isotopic ratios of particles accurately and precisely from samples obtained by inspectors [Boulyga et al., J. Anal. At. Spectrom. 30, 1469 (2015)]. As the particle mass can be on the order of subpicograms, it is important to maximize the sample utilization efficiency of U+ to make high-quality isotopic measurements. The influence of primary ion beam species and polarity on U+ sample utilization efficiency has been previously investigated by Ranebo et al. [J. Anal. At. Spectrom. 24, 277 (2009)]. However, the effect of sample substrate on uranium ion production efficiency and sputtering profile has not been investigated. This work will explore those influences on sample utilization efficiency by analyzing monodisperse uranium oxide microspheres deposited onto graphite and silicon planchets. The particles were mapped using an automated scanning electron microscope, and their coordinates were co...","PeriodicalId":38110,"journal":{"name":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","volume":null,"pages":null},"PeriodicalIF":1.5000,"publicationDate":"2016-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1116/1.4942612","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1116/1.4942612","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 11

Abstract

Secondary ion mass spectrometry (SIMS) plays an important role in nuclear forensics through its ability to identify isotopic ratios of particles accurately and precisely from samples obtained by inspectors [Boulyga et al., J. Anal. At. Spectrom. 30, 1469 (2015)]. As the particle mass can be on the order of subpicograms, it is important to maximize the sample utilization efficiency of U+ to make high-quality isotopic measurements. The influence of primary ion beam species and polarity on U+ sample utilization efficiency has been previously investigated by Ranebo et al. [J. Anal. At. Spectrom. 24, 277 (2009)]. However, the effect of sample substrate on uranium ion production efficiency and sputtering profile has not been investigated. This work will explore those influences on sample utilization efficiency by analyzing monodisperse uranium oxide microspheres deposited onto graphite and silicon planchets. The particles were mapped using an automated scanning electron microscope, and their coordinates were co...

Abstract Image