Large area few-layer TMD film growths and their applications.

IF 4.9 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
JPhys Materials Pub Date : 2020-04-01 Epub Date: 2020-04-27 DOI:10.1088/2515-7639/ab82b3
Srinivas V Mandyam, Hyong M Kim, Marija Drndić
{"title":"Large area few-layer TMD film growths and their applications.","authors":"Srinivas V Mandyam,&nbsp;Hyong M Kim,&nbsp;Marija Drndić","doi":"10.1088/2515-7639/ab82b3","DOIUrl":null,"url":null,"abstract":"<p><p>Research on 2D materials is one of the core themes of modern condensed matter physics. Prompted by the experimental isolation of graphene, much attention has been given to the unique optical, electronic, and structural properties of these materials. In the past few years, semiconducting transition metal dichalcogenides (TMDs) have attracted increasing interest due to properties such as direct band gaps and intrinsically broken inversion symmetry. Practical utilization of these properties demands large-area synthesis. While films of graphene have been by now synthesized on the order of square meters, analogous achievements are difficult for TMDs given the complexity of their growth kinetics. This article provides an overview of methods used to synthesize films of mono- and few-layer TMDs, comparing spatial and time scales for the different growth strategies. A special emphasis is placed on the unique applications enabled by such large-scale realization, in fields such as electronics and optics.</p>","PeriodicalId":36054,"journal":{"name":"JPhys Materials","volume":"3 2","pages":""},"PeriodicalIF":4.9000,"publicationDate":"2020-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1088/2515-7639/ab82b3","citationCount":"26","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"JPhys Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1088/2515-7639/ab82b3","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2020/4/27 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 26

Abstract

Research on 2D materials is one of the core themes of modern condensed matter physics. Prompted by the experimental isolation of graphene, much attention has been given to the unique optical, electronic, and structural properties of these materials. In the past few years, semiconducting transition metal dichalcogenides (TMDs) have attracted increasing interest due to properties such as direct band gaps and intrinsically broken inversion symmetry. Practical utilization of these properties demands large-area synthesis. While films of graphene have been by now synthesized on the order of square meters, analogous achievements are difficult for TMDs given the complexity of their growth kinetics. This article provides an overview of methods used to synthesize films of mono- and few-layer TMDs, comparing spatial and time scales for the different growth strategies. A special emphasis is placed on the unique applications enabled by such large-scale realization, in fields such as electronics and optics.

Abstract Image

Abstract Image

Abstract Image

大面积少层TMD薄膜生长及其应用。
二维材料的研究是现代凝聚态物理的核心主题之一。由于石墨烯的实验分离,这些材料独特的光学、电子和结构特性引起了人们的广泛关注。在过去的几年中,半导体过渡金属二硫族化合物(TMDs)由于其直接带隙和本质破缺反转对称性等特性而引起了人们越来越多的兴趣。这些性质的实际应用需要大面积合成。虽然目前石墨烯薄膜的合成已经达到了平方米量级,但由于其生长动力学的复杂性,tmd很难取得类似的成就。本文综述了单层和多层tmd薄膜的合成方法,并对不同生长策略的空间和时间尺度进行了比较。特别强调的是这种大规模实现在电子和光学等领域的独特应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
JPhys Materials
JPhys Materials Physics and Astronomy-Condensed Matter Physics
CiteScore
10.30
自引率
2.10%
发文量
40
审稿时长
12 weeks
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信