Direct patterning of coplanar polyethylene glycol alkylsilane monolayers by deep-ultraviolet photolithography as a general method for high fidelity, long-term cell patterning and culture.

Pub Date : 2011-03-01 Epub Date: 2011-03-10 DOI:10.1116/1.3549127
Kerry Wilson, Maria Stancescu, Mainak Das, John Rumsey, James Hickman
{"title":"Direct patterning of coplanar polyethylene glycol alkylsilane monolayers by deep-ultraviolet photolithography as a general method for high fidelity, long-term cell patterning and culture.","authors":"Kerry Wilson, Maria Stancescu, Mainak Das, John Rumsey, James Hickman","doi":"10.1116/1.3549127","DOIUrl":null,"url":null,"abstract":"<p><p>This manuscript details a general method for patterning coplanar alkylsilane monolayers using deep-ultraviolet photolithography that has broad application for high fidelity patterning of cells of varying phenotype in long-term cultures. A polyethylene glycol monolayer was formed on a silica substrate and then patterned using 193 nm light from an ArF excimer laser. The regions of photoablation were then rederivatized with (3-trimethoxysilyl propyl) diethyltriamine (DETA), yielding high contrast cytophilic islands that promoted cell adhesion and growth. Rat hippocampal neurons, motoneurons, and myoblasts were then cultured in a defined, serum-free medium on the patterned surfaces for periods in excess of 40 days. This approach has been shown to be useful as a general method for the long-term culture of multiple cell types in highly defined spatial patterns and can be used for supporting complex cocultures for creating in vitro models for biological systems.</p>","PeriodicalId":74007,"journal":{"name":"","volume":"29 2","pages":"21020"},"PeriodicalIF":0.0,"publicationDate":"2011-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3427986/pdf/JVTBD9-000029-021020_1.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1116/1.3549127","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2011/3/10 0:00:00","PubModel":"Epub","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This manuscript details a general method for patterning coplanar alkylsilane monolayers using deep-ultraviolet photolithography that has broad application for high fidelity patterning of cells of varying phenotype in long-term cultures. A polyethylene glycol monolayer was formed on a silica substrate and then patterned using 193 nm light from an ArF excimer laser. The regions of photoablation were then rederivatized with (3-trimethoxysilyl propyl) diethyltriamine (DETA), yielding high contrast cytophilic islands that promoted cell adhesion and growth. Rat hippocampal neurons, motoneurons, and myoblasts were then cultured in a defined, serum-free medium on the patterned surfaces for periods in excess of 40 days. This approach has been shown to be useful as a general method for the long-term culture of multiple cell types in highly defined spatial patterns and can be used for supporting complex cocultures for creating in vitro models for biological systems.

通过深紫外光刻法直接绘制共面聚乙二醇烷基硅烷单层图案,作为高保真、长期细胞图案化和培养的通用方法。
本手稿详细介绍了一种利用深紫外光平刻技术对共面烷基硅烷单层进行图案化的通用方法,该方法可广泛应用于在长期培养中对不同表型的细胞进行高保真图案化。在二氧化硅基底上形成聚乙二醇单层,然后使用 ArF 准分子激光器发出的 193 纳米光进行图案化。然后用 (3-trimethoxysilyl propyl) diethyltriamine (DETA) 对光消融区域进行再活化,形成高对比度的嗜细胞岛,促进细胞粘附和生长。然后,大鼠海马神经元、运动神经元和肌母细胞在特定的无血清培养基中,在图案化表面上进行超过 40 天的培养。事实证明,这种方法是在高度确定的空间模式下长期培养多种类型细胞的通用方法,可用于支持复杂的共培养,以创建生物系统的体外模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信