Effect of margin design and processing steps on marginal adaptation of captek restorations.

ISRN dentistry Pub Date : 2011-01-01 Epub Date: 2011-06-08 DOI:10.5402/2011/810565
Amy Shih, Robert Flinton, Jayalakshmi Vaidyanathan, Tritala Vaidyanathan
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引用次数: 3

Abstract

This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins.

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边缘设计和加工步骤对captek修复体边缘适应性的影响。
本研究考察了在选定的加工步骤中,四种边缘设计对Captek冠边缘适应性的影响。制作24个Captek冠,4种边缘设计各6个:肩(A组)、倒角(B组)、带斜角的倒角(C组)和带斜角的肩(D组)。在覆盖阶段(第1阶段)、随后的烤瓷应用(第2阶段)和胶结(第3阶段),在每个样品的选定点测量冠和匹配模具之间的边缘差异。使用数字成像方法测量边缘间隙。结果表明,边际差随边际设计的变化顺序为a >B>C>D。各加工工序间的变化趋势依次为阶段3 <阶段1 <阶段2。瓷烧制对边缘适应无显著影响,而固接降低了边缘适应。一般来说,Captek修复体的边缘间隙在所有情况下都小于陶瓷修复体可接受的边缘间隙范围。这些结果在临床上是有利的,并且可能与Captek金属顶部边缘的基体相的延展性和可抛光性有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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