Micelle formation by a long-chain cation surfactant in aqueous solutions of the lower quaternary ammonium bromides

Joseph Steigman, Irving Cohen, Frank Spingola
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引用次数: 19

Abstract

The critical micelle concentrations (CMC) of long-chain cationic and anionic surfactants in water are lowered by the addition of ordinary salts like NaCl. This is usually ascribed to electrostatic effects. It has been found that the CMC of hexadecyltrimethylammonium bromide in water at 30°C. is at first decreased by the addition of the lower quaternary bromides and then increases markedly at higher salt concentration. The initial CMC decrease is in the order K+ < (CH3)4N+ < (C2H5)4N+ < (n − C3H7)4N < (n − C4H9)4N+. There is a continually decreasing value of the CMC in increasingly concentrated KBr solutions. However, there is a minimum CMC value for each added quaternary salt. Those for (CH3)4N+ and (C2H5)4N+ are found in approximately 0.09 M and 0.01 M salt, respectively, that for the n-propyl compound is at 10−3 M solution. In more concentrated salt solutions the CMC is three to five times greater than in water, with the greatest increase found in (n − C4H9)4 NBr solution, and the smallest increase in (CH3)4NBr at equal concentrations. The results are interpreted in terms of the effects of added electrolytes on the hydrogen-bonded structure of water. It is concluded that micelle formation is rendered more difficult by electrolytes which organize the solvent structure, and occurs at lower soap concentrations in the presence of structure-disrupting electrolytes like the alkali halides.

长链阳离子表面活性剂在低季溴化铵水溶液中的胶束形成
NaCl等普通盐的加入降低了水中长链阳离子和阴离子表面活性剂的临界胶束浓度(CMC)。这通常归因于静电效应。在30℃的水中发现十六烷基三甲基溴化铵的CMC。在加入较低的季溴化物时,它首先降低,然后在较高的盐浓度下显著增加。初始CMC降低量为K+ <(CH3) 4 n + & lt;(C2H5) 4 n + & lt;(n−C3H7)4N <(n−C4H9)4N+。在浓度越来越高的KBr溶液中,CMC值不断降低。然而,每种添加的季盐都有一个最小CMC值。(CH3)4N+和(C2H5)4N+分别在约0.09 M和0.01 M的盐中存在,而正丙基化合物在10−3 M的溶液中存在。在较浓的盐溶液中,CMC是在水中的3 ~ 5倍,在(n−C4H9) 4NBr溶液中增加最多,在相同浓度的(CH3)4NBr溶液中增加最少。结果是根据添加的电解质对水的氢键结构的影响来解释的。由此得出结论,胶束的形成在组织溶剂结构的电解质中变得更加困难,并且在较低的肥皂浓度下,在碱卤化物等破坏结构的电解质存在下发生。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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