Rawan B Fadhil, Evan T Salim, Subash C B Gopinath, Motahher A Qaeed
{"title":"Enhanced UV photodetection of Ag-decorated GaN/Si heterojunctions prepared by pulsed laser ablation in liquid and hydrothermal deposition.","authors":"Rawan B Fadhil, Evan T Salim, Subash C B Gopinath, Motahher A Qaeed","doi":"10.1364/AO.613902","DOIUrl":null,"url":null,"abstract":"<p><p>In this study, GaN nanoparticles were synthesized by pulsed laser ablation in liquid (PLAL) followed by hydrothermal deposition. Different AgNO<sub>3</sub> concentrations were comparatively investigated to determine the optimum amount for fabricating the Ag-decorated GaN/Si UV photodetector. Among the investigated amounts, the sample prepared using 0.01 g AgNO<sub>3</sub> exhibited the highest figure of merit and was therefore selected for detailed characterization and device fabrication. Ag diffraction peaks and the hexagonal wurtzite GaN phase were confirmed by XRD investigation. Optical measurements showed a bandgap of 3.37 eV. FESEM and AFM analyses revealed a uniform distribution of Ag nanoparticles, indicating successful surface modification. Based on these improved physical properties, the Ag-decorated GaN/Si heterojunction photodetector was fabricated, exhibiting enhanced responsivity, detectivity, and overall UV-photodetection performance. The Ag-decorated device exhibited improved electrical performance and higher responsivity and detectivity at 380 nm compared with the pure GaN/Si device. The ideality factor (n) was reduced to 1.6 for the Ag-decorated GaN/Si heterojunction device. The faster response of the Ag-decorated GaN/Si device demonstrates its potential for fast-switching optoelectronic applications.</p>","PeriodicalId":101299,"journal":{"name":"Applied optics","volume":"65 29","pages":"10265-10274"},"PeriodicalIF":0.0000,"publicationDate":"2026-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/AO.613902","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2026/9/21 0:00:00","PubModel":"Epub","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, GaN nanoparticles were synthesized by pulsed laser ablation in liquid (PLAL) followed by hydrothermal deposition. Different AgNO3 concentrations were comparatively investigated to determine the optimum amount for fabricating the Ag-decorated GaN/Si UV photodetector. Among the investigated amounts, the sample prepared using 0.01 g AgNO3 exhibited the highest figure of merit and was therefore selected for detailed characterization and device fabrication. Ag diffraction peaks and the hexagonal wurtzite GaN phase were confirmed by XRD investigation. Optical measurements showed a bandgap of 3.37 eV. FESEM and AFM analyses revealed a uniform distribution of Ag nanoparticles, indicating successful surface modification. Based on these improved physical properties, the Ag-decorated GaN/Si heterojunction photodetector was fabricated, exhibiting enhanced responsivity, detectivity, and overall UV-photodetection performance. The Ag-decorated device exhibited improved electrical performance and higher responsivity and detectivity at 380 nm compared with the pure GaN/Si device. The ideality factor (n) was reduced to 1.6 for the Ag-decorated GaN/Si heterojunction device. The faster response of the Ag-decorated GaN/Si device demonstrates its potential for fast-switching optoelectronic applications.
在本研究中,采用脉冲激光在液体中烧蚀(PLAL)和水热沉积的方法合成了氮化镓纳米颗粒。比较研究了不同浓度的AgNO3,以确定制备ag修饰GaN/Si紫外光电探测器的最佳用量。在所研究的量中,使用0.01 g AgNO3制备的样品表现出最高的优点,因此被选中进行详细的表征和器件制造。通过XRD研究证实了Ag衍射峰和六方纤锌矿GaN相。光学测量显示带隙为3.37 eV。FESEM和AFM分析显示银纳米颗粒分布均匀,表明表面改性成功。基于这些改进的物理性质,制备了ag修饰的GaN/Si异质结光电探测器,具有增强的响应性,探测性和整体紫外光电探测性能。与纯GaN/Si器件相比,ag修饰器件在380 nm处具有更好的电学性能和更高的响应率和探测率。ag修饰的GaN/Si异质结器件的理想因数(n)降至1.6。ag修饰的GaN/Si器件的更快响应表明其在快速开关光电应用中的潜力。