{"title":"First-principles study on the regulation of vacancy defects in two-dimensional MoSi2N4 as an anode material for potassium-ion batteries","authors":"Hua Wu, Hongyang Zhang, Yujie Zhao, Wenqi Shi, Shufan Yang, Chenyu Yang, Junqing Wen, Wanlin He","doi":"10.1007/s00894-026-06993-0","DOIUrl":null,"url":null,"abstract":"<div><h3>Context</h3><p>In this paper, the adsorption properties of K atoms on the surface of two-dimensional MoSi<sub>2</sub>N<sub>4</sub> were investigated via density functional theory. It was found that the adsorption energies of K atom at the Mo-top, N-top and Si-top sites of pristine MoSi<sub>2</sub>N<sub>4</sub> were − 0.03 eV, − 0.05 eV and − 0.08 eV, respectively. The diffusion barrier of K atom on the MoSi<sub>2</sub>N<sub>4</sub> surface was calculated to be only 0.052 eV, indicating the excellent diffusion ability of K atom on MoSi<sub>2</sub>N<sub>4</sub>. With the increasing of adsorbed K atoms, stable adsorption of K atoms on the MoSi<sub>2</sub>N<sub>4</sub> surface was no longer achievable. By introducing Si-vacancy defects, the adsorption energy of K atoms at the most favourable adsorption site on the MoSi<sub>2</sub>N<sub>4</sub> surface reached − 3.92 eV. Compared with pristine MoSi<sub>2</sub>N<sub>4</sub>, the adsorption strength was enhanced by approximately 50 times. Meanwhile, the number of stably adsorbed K atoms increased from 1 to 6. Accordingly, a maximum theoretical K storage capacity of 773 mAh/g and an open-circuit voltage of 1.66 V were obtained. Moreover, the diffusion barrier of K atom on the V<sub>Si</sub>-MoSi<sub>2</sub>N<sub>4</sub> surface was calculated to be 0.053 eV. The modified two-dimensional MoSi<sub>2</sub>N<sub>4</sub> combined excellent K atom transport capability with moderate adsorption strength, demonstrating its potential application as an anode material for potassium-ion batteries.</p><h3>Methods</h3><p>First-principles calculations based on density functional theory were performed to investigate the effects of vacancy defects on the potassium-storage properties of two-dimensional MoSi<sub>2</sub>N<sub>4</sub>. All calculations were performed using the Vienna ab initio Simulation Package. The generalized gradient approximation with the Perdew–Burke–Ernzerhof exchange–correlation functional was adopted for structural relaxation and energy calculation. The Heyd–Scuseria–Ernzerhof hybrid functional was utilized to calculate electronic band structures and acquire accurate band gap values. The projector augmented-wave method was employed to describe core–valence electronic interactions, and the DFT-D3(BJ) approach was used to account for van der Waals interactions. The CI-NEB method and AIMD simulations were separately adopted to evaluate the diffusion kinetics and thermal stability of the material system.</p></div>","PeriodicalId":651,"journal":{"name":"Journal of Molecular Modeling","volume":"32 11","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2026-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Molecular Modeling","FirstCategoryId":"92","ListUrlMain":"https://link.springer.com/article/10.1007/s00894-026-06993-0","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"BIOCHEMISTRY & MOLECULAR BIOLOGY","Score":null,"Total":0}
引用次数: 0
Abstract
Context
In this paper, the adsorption properties of K atoms on the surface of two-dimensional MoSi2N4 were investigated via density functional theory. It was found that the adsorption energies of K atom at the Mo-top, N-top and Si-top sites of pristine MoSi2N4 were − 0.03 eV, − 0.05 eV and − 0.08 eV, respectively. The diffusion barrier of K atom on the MoSi2N4 surface was calculated to be only 0.052 eV, indicating the excellent diffusion ability of K atom on MoSi2N4. With the increasing of adsorbed K atoms, stable adsorption of K atoms on the MoSi2N4 surface was no longer achievable. By introducing Si-vacancy defects, the adsorption energy of K atoms at the most favourable adsorption site on the MoSi2N4 surface reached − 3.92 eV. Compared with pristine MoSi2N4, the adsorption strength was enhanced by approximately 50 times. Meanwhile, the number of stably adsorbed K atoms increased from 1 to 6. Accordingly, a maximum theoretical K storage capacity of 773 mAh/g and an open-circuit voltage of 1.66 V were obtained. Moreover, the diffusion barrier of K atom on the VSi-MoSi2N4 surface was calculated to be 0.053 eV. The modified two-dimensional MoSi2N4 combined excellent K atom transport capability with moderate adsorption strength, demonstrating its potential application as an anode material for potassium-ion batteries.
Methods
First-principles calculations based on density functional theory were performed to investigate the effects of vacancy defects on the potassium-storage properties of two-dimensional MoSi2N4. All calculations were performed using the Vienna ab initio Simulation Package. The generalized gradient approximation with the Perdew–Burke–Ernzerhof exchange–correlation functional was adopted for structural relaxation and energy calculation. The Heyd–Scuseria–Ernzerhof hybrid functional was utilized to calculate electronic band structures and acquire accurate band gap values. The projector augmented-wave method was employed to describe core–valence electronic interactions, and the DFT-D3(BJ) approach was used to account for van der Waals interactions. The CI-NEB method and AIMD simulations were separately adopted to evaluate the diffusion kinetics and thermal stability of the material system.
期刊介绍:
The Journal of Molecular Modeling focuses on "hardcore" modeling, publishing high-quality research and reports. Founded in 1995 as a purely electronic journal, it has adapted its format to include a full-color print edition, and adjusted its aims and scope fit the fast-changing field of molecular modeling, with a particular focus on three-dimensional modeling.
Today, the journal covers all aspects of molecular modeling including life science modeling; materials modeling; new methods; and computational chemistry.
Topics include computer-aided molecular design; rational drug design, de novo ligand design, receptor modeling and docking; cheminformatics, data analysis, visualization and mining; computational medicinal chemistry; homology modeling; simulation of peptides, DNA and other biopolymers; quantitative structure-activity relationships (QSAR) and ADME-modeling; modeling of biological reaction mechanisms; and combined experimental and computational studies in which calculations play a major role.