Simultaneous Electrochemical and Inductively Coupled Plasma Optical Emission Spectroscopy Measurements on AA 7075

IF 2.1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
Materials and Corrosion-werkstoffe Und Korrosion Pub Date : 2026-10-05 Epub Date: 2026-07-05 DOI:10.1002/maco.70191
Claudia Kutzer-Schulze, Michael Schneider, Alexander Michaelis
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引用次数: 0

Abstract

This publication deals with the simultaneous acquisition of electrochemical and inductively coupled plasma optical emission spectroscopy (ICP‑OES) data. In a first approach, the authors use well-known materials (Al (99.999%) and AA 7075) to validate the combination of both methods. Low-millimolar sodium chloride solutions are used to evaluate the sensitivity of the combination, whereby the limits of detection and quantification must be considered, as well as the limited sample volume. Besides aluminum, the dissolution of the intermetallic phases, which are typical for the microstructure of AA 7075, was also monitored in terms of both time and potential. Under the selected operating conditions, corrosion rates and current densities were calculated based on ICP-OES and compared with the electrochemically measured values.

AA 7075的电化学和电感耦合等离子体发射光谱同时测量
本出版物涉及电化学和电感耦合等离子体光学发射光谱(ICP‑OES)数据的同时获取。在第一种方法中,作者使用众所周知的材料(Al(99.999%)和AA 7075)来验证两种方法的结合。使用低毫摩尔氯化钠溶液来评估组合的灵敏度,因此必须考虑检测和定量的限制,以及有限的样品量。除铝外,还对AA 7075显微组织中典型的金属间相的溶解进行了时间和电位监测。在选定的操作条件下,基于ICP-OES计算腐蚀速率和电流密度,并与电化学测量值进行比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Materials and Corrosion-werkstoffe Und Korrosion
Materials and Corrosion-werkstoffe Und Korrosion 工程技术-材料科学:综合
CiteScore
3.70
自引率
11.10%
发文量
199
审稿时长
1.4 months
期刊介绍: Materials and Corrosion is the leading European journal in its field, providing rapid and comprehensive coverage of the subject and specifically highlighting the increasing importance of corrosion research and prevention. Several sections exclusive to Materials and Corrosion bring you closer to the current events in the field of corrosion research and add to the impact this journal can make on your work.
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