Physical modeling and uncertainty quantification of dark current in InAs/GaAs QDIPs with AlGaAs current blocking layers

IF 6.9 3区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Hamed Dehdashti Jahromi
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Abstract

The dark current remains the primary limiting factor in the performance of Quantum Dot Infrared Photodetectors (QDIPs), particularly for operation at elevated temperatures. In this work, we present a comprehensive physical model for the dark current transport in InAs/GaAs QDIPs incorporating an Al0.3Ga0.7As current blocking layer. The model integrates the emission-capture framework with a rigorous WKB approximation for field-assisted tunneling in spherical quantum dot geometry. We validate the analytical formulation against experimental data at room temperature (T=290 K), achieving excellent agreement with a logarithmic root-mean-square error of 0.217. A comparative architectural analysis reveals that the inclusion of the heterointerface blocking layer suppresses the dark current by approximately six orders of magnitude compared to standard designs, providing a quantitative theoretical basis for the device’s room-temperature functionality. Furthermore, we perform a Monte Carlo uncertainty quantification to assess manufacturing tolerances, demonstrating that the device performance is robust against quantum dot size fluctuations but highly sensitive to barrier composition variations. These findings establish design guidelines for optimizing high-temperature infrared sensors, predicting a detectivity enhancement of three orders of magnitude with moderate cooling to 200 K.
具有AlGaAs阻流层的InAs/GaAs qdip中暗电流的物理建模和不确定性量化
暗电流仍然是量子点红外探测器(qdip)性能的主要限制因素,特别是在高温下的操作。在这项工作中,我们提出了包含Al0.3Ga0.7As电流阻挡层的InAs/GaAs qdip中暗电流输运的综合物理模型。该模型将排放捕获框架与严格的WKB近似集成在球形量子点几何中的场辅助隧道中。我们根据室温(T=290 K)的实验数据验证了分析公式,获得了极好的一致性,对数均方根误差为0.217。对比结构分析表明,与标准设计相比,异质界面阻挡层的包含可抑制暗电流约6个数量级,为器件的室温功能提供了定量理论基础。此外,我们执行蒙特卡罗不确定性量化来评估制造公差,证明器件性能对量子点尺寸波动具有鲁棒性,但对势垒组成变化高度敏感。这些发现为优化高温红外传感器建立了设计指南,并预测在适度冷却至200 K时,探测能力将提高三个数量级。
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来源期刊
Journal of Science: Advanced Materials and Devices
Journal of Science: Advanced Materials and Devices Materials Science-Electronic, Optical and Magnetic Materials
CiteScore
11.90
自引率
2.50%
发文量
88
审稿时长
47 days
期刊介绍: In 1985, the Journal of Science was founded as a platform for publishing national and international research papers across various disciplines, including natural sciences, technology, social sciences, and humanities. Over the years, the journal has experienced remarkable growth in terms of quality, size, and scope. Today, it encompasses a diverse range of publications dedicated to academic research. Considering the rapid expansion of materials science, we are pleased to introduce the Journal of Science: Advanced Materials and Devices. This new addition to our journal series offers researchers an exciting opportunity to publish their work on all aspects of materials science and technology within the esteemed Journal of Science. With this development, we aim to revolutionize the way research in materials science is expressed and organized, further strengthening our commitment to promoting outstanding research across various scientific and technological fields.
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