{"title":"The Influence of the Concentration of Liquid Glass Solution on the Formation of Hollow SiO2 Particles with Plasma-Electrolyte Spraying","authors":"L. N. Kashapov, R. N. Kashapov, N. F. Kashapov","doi":"10.1134/S1063785026700719","DOIUrl":null,"url":null,"abstract":"<p>The aim of the work is to evaluate the influence of the concentration of a liquid glass solution (Na<sub>2</sub>O·<i>n</i>SiO<sub>2</sub>) on the parameters of plasma-electrolyte spraying and the morphology of hollow SiO<sub>2</sub> microspheres. Solutions with SiO<sub>2</sub> concentration of 0.1, 0.5, 1.0, and 1.5 mol/L were used simultaneously as an electrolyte and a source of silica. The synthesis was carried out at atmospheric pressure in a tip-ring cell at a constant voltage of 400 V for 10 min, followed by washing and drying of the precipitate. The morphology was analyzed using scanning electron microscopy; size statistics were determined for at least 200 particles for each mode, and wall thickness was determined for 30–50 shell fractures. It has been shown that increasing the concentration leads to an increase in the average particle diameter from 4.5 ± 1.8 to 7.0 ± 2.0 μm and a thickening of the shell from 50 ± 10 to 180 ± 30 nm. The proportion of destroyed shells has a minimum in the range of 0.5–1.0 mol/L (15 ± 4 and 10 ± 3%, respectively) and increases both at insufficient and at excessively high concentrations. The optimal range of liquid glass concentrations for obtaining predominantly solid hollow particles is 0.5–1.0 mol/L SiO<sub>2</sub>.</p>","PeriodicalId":784,"journal":{"name":"Technical Physics Letters","volume":"52 6","pages":"336 - 339"},"PeriodicalIF":0.8000,"publicationDate":"2026-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S1063785026700719","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
The aim of the work is to evaluate the influence of the concentration of a liquid glass solution (Na2O·nSiO2) on the parameters of plasma-electrolyte spraying and the morphology of hollow SiO2 microspheres. Solutions with SiO2 concentration of 0.1, 0.5, 1.0, and 1.5 mol/L were used simultaneously as an electrolyte and a source of silica. The synthesis was carried out at atmospheric pressure in a tip-ring cell at a constant voltage of 400 V for 10 min, followed by washing and drying of the precipitate. The morphology was analyzed using scanning electron microscopy; size statistics were determined for at least 200 particles for each mode, and wall thickness was determined for 30–50 shell fractures. It has been shown that increasing the concentration leads to an increase in the average particle diameter from 4.5 ± 1.8 to 7.0 ± 2.0 μm and a thickening of the shell from 50 ± 10 to 180 ± 30 nm. The proportion of destroyed shells has a minimum in the range of 0.5–1.0 mol/L (15 ± 4 and 10 ± 3%, respectively) and increases both at insufficient and at excessively high concentrations. The optimal range of liquid glass concentrations for obtaining predominantly solid hollow particles is 0.5–1.0 mol/L SiO2.
期刊介绍:
Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.