TiNb Films Formed by a Vacuum-Arc Plasma-Assisted Method: Structure and Properties

Abstract

Metastable titanium-based alloys containing niobium, tantalum, zirconium, molybdenum, and a number of other elements (β-Ti alloys) have a relatively low Young’s modulus and are widely used in medicine. The aim of this work is to analyze the structure and properties of Ti–Nb alloys in the form of thin (2.5–3 μm) films deposited during simultaneous vacuum-arc plasma-assisted sputtering of two cathodes. Films with various relative contents of titanium and niobium atoms are shown to be formed by varying the metal cathode evaporator currents. The films are found to have a columnar multilayered structure. The thickness of niobium-rich layers is 3–4 nm and that of titanium-rich layers, 7–35 nm. The main phase of the films is β-TiNb. The microhardness and wear parameter of the deposited films are determined. The dependence of the microhardness and wear parameter on the ratio of the metal cathode evaporator currents has been revealed. The relation between the microhardness and wear resistance of the TiNb films has been found, and it can be used to predict the behavior of the material under operating conditions.