Zn ions-assisted growth of single-crystalline 2D WSe 2 with high quality via chemical vapor deposition

IF 4.3 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Huihui Han, Runzhang Xu, Lei Tang, Banglin Hu, Bowei Wang, Xiaowei Wang, Weiqi Li Li, Caiting Liang, Likuan Ma, Zhongchao Wei, Qijie Liang
{"title":"Zn ions-assisted growth of single-crystalline 2D WSe <sub>2</sub> with high quality via chemical vapor deposition","authors":"Huihui Han, Runzhang Xu, Lei Tang, Banglin Hu, Bowei Wang, Xiaowei Wang, Weiqi Li Li, Caiting Liang, Likuan Ma, Zhongchao Wei, Qijie Liang","doi":"10.1088/2053-1583/ae377a","DOIUrl":null,"url":null,"abstract":"Abstract 2D WSe 2 , as a vital member of p-type transition metal dichalcogenides, exhibits exceptional electronic properties, making it particularly appealing for electronic applications. However, the major bottleneck requires the growth of large-area WSe 2 single crystals with low defect density, which is essential for practical use. In this study, we present a straightforward atmospheric-pressure chemical vapor deposition method that incorporates Zn ions to facilitate the growth of large-area WSe 2 single crystals with 501 μ m (average size is of 236 μ m). The as-grown WSe 2 exhibits high crystallinity and low defect density ranging from 2.4 × 10 12 cm −2 –3.9 × 10 12 cm −2 . Calculations indicate that the presence of Zn ions effectively reduces the reaction free energy associated with the nucleation and growth of WSe 2 , serving as a critical factor that enhances the growth process. The fabricated WSe 2 field-effect transistors exhibit exceptional electrical performance, achieving a maximum field-effect mobility of 46.02 cm 2 V −1 s −1 and an on/off current ratio of 10 6 . This work provides an effective approach for growing high-quality WSe 2 and holds promise for advancing nanoelectronics with superior performance.","PeriodicalId":6812,"journal":{"name":"2D Materials","volume":"13 1","pages":"015027-015027"},"PeriodicalIF":4.3000,"publicationDate":"2026-01-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2D Materials","FirstCategoryId":"0","ListUrlMain":"https://doi.org/10.1088/2053-1583/ae377a","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

Abstract 2D WSe 2 , as a vital member of p-type transition metal dichalcogenides, exhibits exceptional electronic properties, making it particularly appealing for electronic applications. However, the major bottleneck requires the growth of large-area WSe 2 single crystals with low defect density, which is essential for practical use. In this study, we present a straightforward atmospheric-pressure chemical vapor deposition method that incorporates Zn ions to facilitate the growth of large-area WSe 2 single crystals with 501 μ m (average size is of 236 μ m). The as-grown WSe 2 exhibits high crystallinity and low defect density ranging from 2.4 × 10 12 cm −2 –3.9 × 10 12 cm −2 . Calculations indicate that the presence of Zn ions effectively reduces the reaction free energy associated with the nucleation and growth of WSe 2 , serving as a critical factor that enhances the growth process. The fabricated WSe 2 field-effect transistors exhibit exceptional electrical performance, achieving a maximum field-effect mobility of 46.02 cm 2 V −1 s −1 and an on/off current ratio of 10 6 . This work provides an effective approach for growing high-quality WSe 2 and holds promise for advancing nanoelectronics with superior performance.
Zn离子辅助化学气相沉积法制备高质量二维二氧化硅单晶
2D WSe 2作为p型过渡金属二硫族化合物的重要成员,具有优异的电子性能,在电子领域具有特殊的应用价值。然而,主要的瓶颈需要生长大面积的低缺陷密度的WSe 2单晶,这对于实际应用是必不可少的。在本研究中,我们提出了一种直接的常压化学气相沉积方法,该方法结合Zn离子促进了面积为501 μ m(平均尺寸为236 μ m)的大面积WSe 2单晶的生长。生长后的二氧化硅具有较高的结晶度和较低的缺陷密度,缺陷密度范围为2.4 × 10 12 cm−2 -3.9 × 10 12 cm−2。计算表明,Zn离子的存在有效地降低了与WSe 2成核和生长相关的反应自由能,是促进WSe 2生长过程的关键因素。制备的wse2场效应晶体管表现出优异的电学性能,最大场效应迁移率为46.02 cm 2 V−1 s−1,开/关电流比为10.6。这项工作为制备高质量的二氧化硅提供了有效的方法,并有望以优异的性能推进纳米电子学的发展。
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来源期刊
2D Materials
2D Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
10.70
自引率
5.50%
发文量
138
审稿时长
1.5 months
期刊介绍: 2D Materials is a multidisciplinary, electronic-only journal devoted to publishing fundamental and applied research of the highest quality and impact covering all aspects of graphene and related two-dimensional materials.
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