{"title":"Enhancing Titanium Thin Film Properties Through Controlled Sputtering Power: A Multifractal Analysis","authors":"Bandar Astinchap, Suhilla Sami, Erfan Norian, Sayed Mohaiuddin Awrang, Hamta Ghanbaripour, Mona Abdi","doi":"10.1007/s13538-026-02078-8","DOIUrl":null,"url":null,"abstract":"<div><p>This study investigates the surface morphology of titanium thin films deposited on glass substrates using RF-sputtering at varying sputtering powers (500, 550, and 600 W). The films’ surface characteristics were analyzed through atomic force microscopy and multifractal analysis. Results indicate that titanium thin films exhibit multifractal behavior, with increased sputtering power leading to more pronounced multifractality. Higher sputtering powers also resulted in rougher and more heterogeneous surfaces, as revealed by surface roughness measurements and fractal dimension analysis. The study highlights the impact of sputtering power on surface complexity, isotropy, and overall surface activity, emphasizing the importance of these parameters in enhancing the functional properties of titanium thin films. Accurately controlling and measuring these properties are necessary for designing and optimizing thin film materials.</p></div>","PeriodicalId":499,"journal":{"name":"Brazilian Journal of Physics","volume":"56 4","pages":""},"PeriodicalIF":1.7000,"publicationDate":"2026-04-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Brazilian Journal of Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1007/s13538-026-02078-8","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
This study investigates the surface morphology of titanium thin films deposited on glass substrates using RF-sputtering at varying sputtering powers (500, 550, and 600 W). The films’ surface characteristics were analyzed through atomic force microscopy and multifractal analysis. Results indicate that titanium thin films exhibit multifractal behavior, with increased sputtering power leading to more pronounced multifractality. Higher sputtering powers also resulted in rougher and more heterogeneous surfaces, as revealed by surface roughness measurements and fractal dimension analysis. The study highlights the impact of sputtering power on surface complexity, isotropy, and overall surface activity, emphasizing the importance of these parameters in enhancing the functional properties of titanium thin films. Accurately controlling and measuring these properties are necessary for designing and optimizing thin film materials.
期刊介绍：
The Brazilian Journal of Physics is a peer-reviewed international journal published by the Brazilian Physical Society (SBF). The journal publishes new and original research results from all areas of physics, obtained in Brazil and from anywhere else in the world. Contents include theoretical, practical and experimental papers as well as high-quality review papers. Submissions should follow the generally accepted structure for journal articles with basic elements: title, abstract, introduction, results, conclusions, and references.
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