Erratum to: Study of the Influence of the Energy of Argon Ions on the Surface Roughness of the Main Sections of Single-Crystal Silicon

IF 0.4 4区物理与天体物理 Q4 PHYSICS, APPLIED

Technical Physics Pub Date : 2026-02-09 DOI:10.1134/S1063784226010019

M. S. Mikhailenko, A. E. Pestov, A. K. Chernyshev, M. V. Zorina, N. I. Chkhalo, N. N. Salaschenko

引用次数: 0

查看原文本刊更多论文

氩离子能量对单晶硅主要部分表面粗糙度影响的研究

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Technical Physics 物理-物理：应用

CiteScore

1.30

自引率

14.30%

发文量

139

审稿时长

3-6 weeks

期刊介绍： Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.