Spectroscopic investigation of plasma from Al–Ni alloy using OES technique: influence of voltage on plasma parameters

IF 1.7 4区 物理与天体物理 Q2 PHYSICS, MULTIDISCIPLINARY
Mohammed H. Jawad, Mohammed R. Abdulameer
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引用次数: 0

Abstract

This work investigates the effect of applied voltage on the plasma characteristics of an Al–Ni alloy using optical emission spectroscopy (OES). The alloy, composed of 80% aluminum and 20% nickel by weight, was locally fabricated using a gas furnace to ensure compositional uniformity. Argon gas was used to sustain the plasma discharge, and a DC voltage ranging from 5 to 13 kV was applied. Emission spectra were recorded using an S3000-UV-NIR spectrometer. The results revealed a linear increase in both electron temperature and electron density with rising voltage, indicating that voltage plays a critical role in tuning plasma properties. Prominent spectral lines were observed at 811.53 nm (argon), 296.12 nm (aluminum), and 52.263 nm (nickel). The electron temperature increased from 0.108 eV to 0.662 eV, while electron density rose from 4.80 × 1017 cm−3 to 9.88 × 1017 cm−3. Additionally, the combined influence of gas flow rate and voltage on plasma flame length was examined, revealing a direct and interactive relationship that contributes to producing a more stable and homogeneous plasma. These findings emphasize the importance of optimizing operating conditions to generate controlled plasma suitable for industrial, technological, and medical applications.

用OES技术对铝镍合金等离子体的光谱研究:电压对等离子体参数的影响
本文利用光学发射光谱(OES)研究了外加电压对铝镍合金等离子体特性的影响。该合金由重量80%的铝和20%的镍组成,是用煤气炉在当地制造的,以确保成分均匀。采用氩气支撑等离子体放电,施加5 ~ 13 kV直流电压。发射光谱用S3000-UV-NIR光谱仪记录。结果表明,随着电压的升高,电子温度和电子密度呈线性增加,表明电压对等离子体性能的调节起着至关重要的作用。在811.53 nm(氩)、296.12 nm(铝)和52.263 nm(镍)处观察到明显的光谱线。电子温度从0.108 eV增加到0.662 eV,电子密度从4.80 × 1017 cm−3增加到9.88 × 1017 cm−3。此外,研究了气体流速和电压对等离子体火焰长度的综合影响,揭示了一种直接的相互作用关系,有助于产生更稳定和均匀的等离子体。这些发现强调了优化操作条件以产生适用于工业、技术和医疗应用的受控等离子体的重要性。
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来源期刊
Indian Journal of Physics
Indian Journal of Physics 物理-物理:综合
CiteScore
3.40
自引率
10.00%
发文量
275
审稿时长
3-8 weeks
期刊介绍: Indian Journal of Physics is a monthly research journal in English published by the Indian Association for the Cultivation of Sciences in collaboration with the Indian Physical Society. The journal publishes refereed papers covering current research in Physics in the following category: Astrophysics, Atmospheric and Space physics; Atomic & Molecular Physics; Biophysics; Condensed Matter & Materials Physics; General & Interdisciplinary Physics; Nonlinear dynamics & Complex Systems; Nuclear Physics; Optics and Spectroscopy; Particle Physics; Plasma Physics; Relativity & Cosmology; Statistical Physics.
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