{"title":"Spectroscopic investigation of plasma from Al–Ni alloy using OES technique: influence of voltage on plasma parameters","authors":"Mohammed H. Jawad, Mohammed R. Abdulameer","doi":"10.1007/s12648-025-03738-2","DOIUrl":null,"url":null,"abstract":"<div><p>This work investigates the effect of applied voltage on the plasma characteristics of an Al–Ni alloy using optical emission spectroscopy (OES). The alloy, composed of 80% aluminum and 20% nickel by weight, was locally fabricated using a gas furnace to ensure compositional uniformity. Argon gas was used to sustain the plasma discharge, and a DC voltage ranging from 5 to 13 kV was applied. Emission spectra were recorded using an S3000-UV-NIR spectrometer. The results revealed a linear increase in both electron temperature and electron density with rising voltage, indicating that voltage plays a critical role in tuning plasma properties. Prominent spectral lines were observed at 811.53 nm (argon), 296.12 nm (aluminum), and 52.263 nm (nickel). The electron temperature increased from 0.108 eV to 0.662 eV, while electron density rose from 4.80 × 10<sup>17</sup> cm<sup>−3</sup> to 9.88 × 10<sup>17</sup> cm<sup>−3</sup>. Additionally, the combined influence of gas flow rate and voltage on plasma flame length was examined, revealing a direct and interactive relationship that contributes to producing a more stable and homogeneous plasma. These findings emphasize the importance of optimizing operating conditions to generate controlled plasma suitable for industrial, technological, and medical applications.</p></div>","PeriodicalId":584,"journal":{"name":"Indian Journal of Physics","volume":"99 12","pages":"4845 - 4850"},"PeriodicalIF":1.7000,"publicationDate":"2025-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Indian Journal of Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1007/s12648-025-03738-2","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
This work investigates the effect of applied voltage on the plasma characteristics of an Al–Ni alloy using optical emission spectroscopy (OES). The alloy, composed of 80% aluminum and 20% nickel by weight, was locally fabricated using a gas furnace to ensure compositional uniformity. Argon gas was used to sustain the plasma discharge, and a DC voltage ranging from 5 to 13 kV was applied. Emission spectra were recorded using an S3000-UV-NIR spectrometer. The results revealed a linear increase in both electron temperature and electron density with rising voltage, indicating that voltage plays a critical role in tuning plasma properties. Prominent spectral lines were observed at 811.53 nm (argon), 296.12 nm (aluminum), and 52.263 nm (nickel). The electron temperature increased from 0.108 eV to 0.662 eV, while electron density rose from 4.80 × 1017 cm−3 to 9.88 × 1017 cm−3. Additionally, the combined influence of gas flow rate and voltage on plasma flame length was examined, revealing a direct and interactive relationship that contributes to producing a more stable and homogeneous plasma. These findings emphasize the importance of optimizing operating conditions to generate controlled plasma suitable for industrial, technological, and medical applications.
期刊介绍:
Indian Journal of Physics is a monthly research journal in English published by the Indian Association for the Cultivation of Sciences in collaboration with the Indian Physical Society. The journal publishes refereed papers covering current research in Physics in the following category: Astrophysics, Atmospheric and Space physics; Atomic & Molecular Physics; Biophysics; Condensed Matter & Materials Physics; General & Interdisciplinary Physics; Nonlinear dynamics & Complex Systems; Nuclear Physics; Optics and Spectroscopy; Particle Physics; Plasma Physics; Relativity & Cosmology; Statistical Physics.