Jacob Som,Austin J Reese,Luka Mitrovic,R Soyoung Kim,Shay McBride,Swapnil S Nalawade,Shyam Aravamudhan,Geoffroy Hautier,Junko Yano,Darrell G Schlom,Jin Suntivich
{"title":"Strained-Induced Morphological Reconstruction of RuO2(110) Thin-Film Electrocatalysts.","authors":"Jacob Som,Austin J Reese,Luka Mitrovic,R Soyoung Kim,Shay McBride,Swapnil S Nalawade,Shyam Aravamudhan,Geoffroy Hautier,Junko Yano,Darrell G Schlom,Jin Suntivich","doi":"10.1021/jacs.5c08607","DOIUrl":null,"url":null,"abstract":"Strain is a widely used strategy for electrocatalyst engineering. Overstraining, however, can lead to unintentional materials transformation. We investigate the impact of strain on the surface morphology of a rutile RuO2(110) film grown on a symmetry-matching rutile TiO2(110) substrate. When the film thickness exceeds 9 nm, the RuO2 surface relaxes by forming step edges that expose the {011} plane. Density functional theory (DFT) calculation shows that the (011) facet is among the lower energy surfaces of rutile RuO2, suggesting that this formation incurs minimal energetic penalties. In situ atomic force microscopy (AFM) shows that the film maintains the (110) structure of the terrace during electrochemistry. Inductively coupled plasma-mass spectrometry (ICP-MS) further reveals the insensitivity of the Ru dissolution to strain. Our findings show a strain-relieving pathway via surface reconstruction in RuO2(110) and provide an example of a strain-relieving mechanism that does not affect dissolution.","PeriodicalId":49,"journal":{"name":"Journal of the American Chemical Society","volume":"104 1","pages":""},"PeriodicalIF":15.6000,"publicationDate":"2025-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the American Chemical Society","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1021/jacs.5c08607","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Strain is a widely used strategy for electrocatalyst engineering. Overstraining, however, can lead to unintentional materials transformation. We investigate the impact of strain on the surface morphology of a rutile RuO2(110) film grown on a symmetry-matching rutile TiO2(110) substrate. When the film thickness exceeds 9 nm, the RuO2 surface relaxes by forming step edges that expose the {011} plane. Density functional theory (DFT) calculation shows that the (011) facet is among the lower energy surfaces of rutile RuO2, suggesting that this formation incurs minimal energetic penalties. In situ atomic force microscopy (AFM) shows that the film maintains the (110) structure of the terrace during electrochemistry. Inductively coupled plasma-mass spectrometry (ICP-MS) further reveals the insensitivity of the Ru dissolution to strain. Our findings show a strain-relieving pathway via surface reconstruction in RuO2(110) and provide an example of a strain-relieving mechanism that does not affect dissolution.
期刊介绍:
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