Deposition of Silicon-Carbon Coatings by Electron Beam Evaporation of Silicon Carbide in an Oxygen-Containing Medium

IF 0.3 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY
V. A. Burdovitsin, A. A. Andronov, L. J. Ngon A Kiki, F. A. Sukhovolsky
{"title":"Deposition of Silicon-Carbon Coatings by Electron Beam Evaporation of Silicon Carbide in an Oxygen-Containing Medium","authors":"V. A. Burdovitsin,&nbsp;A. A. Andronov,&nbsp;L. J. Ngon A Kiki,&nbsp;F. A. Sukhovolsky","doi":"10.1134/S2075113325701667","DOIUrl":null,"url":null,"abstract":"<p>The electrical, mechanical and optical properties of silicon-carbon films obtained by electron beam evaporation of silicon carbide in an argon-oxygen gas mixture in the pressure range 3–5 Pa are presented. The electron beam was generated by a fore-vacuum plasma electron source. It is shown that with an increase in the oxygen content in the gas, the resistivity of the films increases, the hardness decreases and the optical band gap raises. Measurements of the composition and analysis of IR transmission spectra indicate the replacement of silicon-carbon bonds with silicon-oxygen bonds as the gaseous medium is enriched with oxygen.</p>","PeriodicalId":586,"journal":{"name":"Inorganic Materials: Applied Research","volume":"16 5","pages":"1541 - 1545"},"PeriodicalIF":0.3000,"publicationDate":"2025-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Inorganic Materials: Applied Research","FirstCategoryId":"1085","ListUrlMain":"https://link.springer.com/article/10.1134/S2075113325701667","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

The electrical, mechanical and optical properties of silicon-carbon films obtained by electron beam evaporation of silicon carbide in an argon-oxygen gas mixture in the pressure range 3–5 Pa are presented. The electron beam was generated by a fore-vacuum plasma electron source. It is shown that with an increase in the oxygen content in the gas, the resistivity of the films increases, the hardness decreases and the optical band gap raises. Measurements of the composition and analysis of IR transmission spectra indicate the replacement of silicon-carbon bonds with silicon-oxygen bonds as the gaseous medium is enriched with oxygen.

Abstract Image

含氧介质中碳化硅电子束蒸发沉积硅碳涂层的研究
本文介绍了碳化硅在3 ~ 5 Pa的氩气-氧气混合物中电子束蒸发得到的硅碳薄膜的电学、力学和光学性能。电子束由前真空等离子体电子源产生。结果表明,随着气体中氧含量的增加,薄膜的电阻率增大,硬度降低,光学带隙增大。红外透射光谱的测量和分析表明,由于气体介质富含氧气,硅-碳键被硅-氧键取代。
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来源期刊
Inorganic Materials: Applied Research
Inorganic Materials: Applied Research Engineering-Engineering (all)
CiteScore
0.90
自引率
0.00%
发文量
199
期刊介绍: Inorganic Materials: Applied Research  contains translations of research articles devoted to applied aspects of inorganic materials. Best articles are selected from four Russian periodicals: Materialovedenie, Perspektivnye Materialy, Fizika i Khimiya Obrabotki Materialov, and Voprosy Materialovedeniya  and translated into English. The journal reports recent achievements in materials science: physical and chemical bases of materials science; effects of synergism in composite materials; computer simulations; creation of new materials (including carbon-based materials and ceramics, semiconductors, superconductors, composite materials, polymers, materials for nuclear engineering, materials for aircraft and space engineering, materials for quantum electronics, materials for electronics and optoelectronics, materials for nuclear and thermonuclear power engineering, radiation-hardened materials, materials for use in medicine, etc.); analytical techniques; structure–property relationships; nanostructures and nanotechnologies; advanced technologies; use of hydrogen in structural materials; and economic and environmental issues. The journal also considers engineering issues of materials processing with plasma, high-gradient crystallization, laser technology, and ultrasonic technology. Currently the journal does not accept direct submissions, but submissions to one of the source journals is possible.
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