V. G. Dubrovskii, M. V. Rylkova, A. S. Sokolovskii, Zh. V. Sokolova
{"title":"Asymptotic Stage of Self-Catalyzed Growth of III–V Nanowires by Molecular Beam Epitaxy","authors":"V. G. Dubrovskii, M. V. Rylkova, A. S. Sokolovskii, Zh. V. Sokolova","doi":"10.1134/S1063785023170066","DOIUrl":null,"url":null,"abstract":"<p><b>Abstract</b>—A new analytic theory is developed for asymptotic stage of self-catalyzed growth of III–V nanowires (NWs) by molecular beam epitaxy (MBE), where NWs collect all group III atoms deposited from vapor. The shadowing NW length is derived which corresponds for the full shadowing of the substrate surface in MBE. The NW length and radius are derived depending on the effective deposition thickness and MBE growth parameters. It is shown that the NW length increases, and their length decreases with decreasing the array pitch and increasing the V/III flux ratio.</p>","PeriodicalId":784,"journal":{"name":"Technical Physics Letters","volume":"50 2","pages":"106 - 109"},"PeriodicalIF":0.9000,"publicationDate":"2024-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S1063785023170066","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract—A new analytic theory is developed for asymptotic stage of self-catalyzed growth of III–V nanowires (NWs) by molecular beam epitaxy (MBE), where NWs collect all group III atoms deposited from vapor. The shadowing NW length is derived which corresponds for the full shadowing of the substrate surface in MBE. The NW length and radius are derived depending on the effective deposition thickness and MBE growth parameters. It is shown that the NW length increases, and their length decreases with decreasing the array pitch and increasing the V/III flux ratio.
期刊介绍:
Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.