Double-patterned waveguide resonators with conventional UV contact lithography.

Applied optics Pub Date : 2025-09-20 DOI:10.1364/AO.569558
Pei-Hsun Wang, Hung-Yu Chen, Yi Chang, Hsin-An Chen, Jia-Hao Cao, Yi-Xian Zhong, Chi-Ruei Huang
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引用次数: 0

Abstract

We propose a method for fabricating integrated microresonators using conventional ultraviolet contact lithography. By a double-patterning scheme, the bus- and resonator-waveguide can be lithography-patterned individually with a single photoresist spinning and etching process. A sub-µm gap is achieved between the bus- and resonator-waveguides, which exceeds the resolution limitation between patterns of the conventional contact-lithography process. The quality (Q) factor of waveguide resonators can be up to ≈104, while the maximum measured extinction ratio of the resonator is larger than 20 dB. This double-patterning method offers easy fabrication, low cost, and sub-µm pitches for silicon photonics.

采用传统UV接触光刻技术的双模式波导谐振器。
我们提出了一种利用常规紫外接触光刻技术制造集成微谐振器的方法。通过双图纹方案,母线波导和谐振腔波导可以通过单个光刻胶旋转和蚀刻工艺分别进行光刻图纹。在母线波导和谐振器波导之间实现了亚微米的间隙,这超过了传统接触光刻工艺模式之间的分辨率限制。波导谐振器的质量(Q)因子可达≈104,而谐振器的最大测量消光比大于20 dB。这种双模式方法为硅光子学提供了易于制造,低成本和亚微米间距的方法。
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