Nanoimprinting of Mesoporous Titania: Direct Patterning and Refractive Index Control in the Visible

IF 7.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Matthew Panipinto, Andrea Martinez Gomez-Aldaravi, David Ortiz de Zárate, Jaime García-Rupérez, Judson D. Ryckman
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Abstract

Porous materials and nanocomposites have emerged as promising media for constructing high performance, tunable, responsive, and versatile optical platforms, with applications spanning diffractive and waveguide optics, metasurfaces, photonic sensors, and structural coatings. Despite their potential, achieving precise control over the structural and optical properties of these materials has remained a significant challenge, often requiring complex fabrication processes and post-lithography processing steps that limit scalability, sustainability, and practical implementation. In this work, upon the use of nanoimprinting of refractive index (NIRI) is reported to directly pattern mesoporous titania (pTiO2) and achieve localized, compression-based modulation of refractive index. Two formulations of sol-gel derived pTiO2 thin films are interrogated, revealing tunable refractive indices ranging from n 1.5 to n 2.2 at visible wavelengths in response to nanoimprinting-induced compression. Using a variety of micro-patterned stamps, the direct fabrication of planar diffractive and gradient index optics is demonstrated without any curing, etching, or post-lithography processing steps. These findings demonstrate that direct imprinting of pTiO₂ is a sustainable and effective method for controlling refractive index and fabricating optical devices, paving the way for future advancements in the development of compression-tuned optical materials and their diverse applications.

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介孔二氧化钛的纳米印迹:直接图像化和可见光折射率控制
多孔材料和纳米复合材料已成为构建高性能、可调谐、响应性强、用途广泛的光学平台的有前途的介质,其应用范围涵盖衍射和波导光学、超表面、光子传感器和结构涂层。尽管具有潜力,但实现对这些材料的结构和光学特性的精确控制仍然是一个重大挑战,通常需要复杂的制造工艺和光刻后处理步骤,这限制了可扩展性、可持续性和实际实施。在这项工作中,利用折射率纳米印迹(NIRI)直接对介孔二氧化钛(pTiO2)进行了图案化,并实现了局部的、基于压缩的折射率调制。研究了两种溶胶-凝胶衍生的pTiO2薄膜的配方,揭示了纳米印迹诱导压缩的可见光折射率范围为n≈1.5至n≈2.2。使用各种微图型印章,直接制造平面衍射和梯度折射率光学器件,无需任何固化,蚀刻或后光刻处理步骤。这些发现表明,直接印迹pTiO 2是一种可持续和有效的方法来控制折射率和制造光学器件,为未来压缩调谐光学材料的发展及其多样化应用铺平了道路。
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来源期刊
Advanced Optical Materials
Advanced Optical Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-OPTICS
CiteScore
13.70
自引率
6.70%
发文量
883
审稿时长
1.5 months
期刊介绍: Advanced Optical Materials, part of the esteemed Advanced portfolio, is a unique materials science journal concentrating on all facets of light-matter interactions. For over a decade, it has been the preferred optical materials journal for significant discoveries in photonics, plasmonics, metamaterials, and more. The Advanced portfolio from Wiley is a collection of globally respected, high-impact journals that disseminate the best science from established and emerging researchers, aiding them in fulfilling their mission and amplifying the reach of their scientific discoveries.
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