Atmospheric pressure plasma etching of Ti-6Al-4 V using SF6 etchant

IF 2 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

International Journal of Mechanical and Materials Engineering Pub Date : 2025-09-11 DOI:10.1186/s40712-024-00200-9

Alex Bishop, Zhaorong Huang, Claudiu Giusca, Adam Bennett, Marco Castelli, Tian Long See

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Abstract

Atmospheric pressure plasma (APP) etching has been developed recently into a manufacturing technique for silicon-based materials used for large optical lenses. However, there are few reports published regarding APP etching of non-silicon-based materials. We report here the development of an APP process using SF₆ for the etching of Ti-6Al-4 V metal alloy. Ti-6Al-4V is extensively used in aerospace and biomedical fields for its excellent properties; however, these properties also make it difficult to machine. Current techniques such as precision grinding and laser polishing can be slow, energy intensive, and cause damages and defects which reduce the lifetime of vital components. The results in this paper demonstrate effective material removal and little surface damage by APP etching of Ti-6Al-4V. Material removal rates between 0.5 and 2 mm³ min⁻¹ were obtained, and the proposed material removal mechanism is through the formation of volatile VF_x and TiF₄. These results show that APP etching is a promising technique for surface finishing of Ti-6Al-4V, particularly for large- and complex-shaped components.

Graphical Abstract

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用SF6蚀刻剂常压等离子体蚀刻ti - 6al - 4v

近年来，大气压等离子体蚀刻技术已发展成为一种用于大型光学透镜的硅基材料的制造技术。然而，关于非硅基材料的APP刻蚀的报道很少。我们在此报告了一种利用SF6蚀刻ti - 6al - 4v金属合金的APP工艺的发展。Ti-6Al-4V因其优异的性能被广泛应用于航空航天和生物医学领域；然而，这些特性也使其难以加工。目前的技术，如精密研磨和激光抛光可能是缓慢的，能量密集的，并造成损坏和缺陷，减少重要部件的寿命。结果表明，采用APP刻蚀法，Ti-6Al-4V材料去除效果好，表面损伤小。材料去除率在0.5 ~ 2 mm3 min−1之间，提出的材料去除机制是通过挥发性VFx和TiF4的形成。这些结果表明，APP刻蚀是一种很有前途的Ti-6Al-4V表面处理技术，特别是对于大型和复杂形状的部件。图形抽象

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