Improving the low-dose performance of aberration correction in single sideband ptychography

IF 2 3区 工程技术 Q2 MICROSCOPY
Songge Li , Nicolas Gauquelin , Hoelen L. Lalandec Robert , Arno Annys , Chuang Gao , Christoph Hofer , Timothy J. Pennycook , Jo Verbeeck
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引用次数: 0

Abstract

The single sideband (SSB) framework of analytical electron ptychography can account for the presence of residual geometrical aberrations induced by the probe-forming lens. However, the accuracy of this aberration correction method is highly sensitive to the invested electron dose, in part due to the necessity of phase unwrapping. In this work, we thus propose two strategies to improve the performance in low-dose conditions: confining phase unwrapping within the sidebands and selecting only well-unwrapped sidebands for calculating aberration coefficients. These strategies are validated through SSB reconstructions of both simulated and experimental 4D-STEM datasets of monolayer tungsten diselenide (WSe2). A comparison of results demonstrates significant improvements in Poisson noise tolerance, making aberration correction more robust and reliable for low-dose imaging.
提高单边带成像像差校正的低剂量性能
分析电子平面摄影的单边带(SSB)框架可以解释探针形成透镜引起的残余几何像差的存在。然而,这种像差校正方法的精度对所投入的电子剂量高度敏感,部分原因是相位展开的必要性。在这项工作中,我们因此提出了两种策略来提高在低剂量条件下的性能:在侧带内限制相位展开和只选择充分展开的侧带来计算像差系数。通过单层二硒化钨(WSe2)的模拟和实验4D-STEM数据集的SSB重建,验证了这些策略。对比结果表明,泊松噪声耐受性显著提高,使像差校正在低剂量成像中更加稳健和可靠。
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来源期刊
Ultramicroscopy
Ultramicroscopy 工程技术-显微镜技术
CiteScore
4.60
自引率
13.60%
发文量
117
审稿时长
5.3 months
期刊介绍: Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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