{"title":"Structural, electronic, piezoelectric, and optical properties of Janus MoSi2Z3X (Z/X = N, P, As) monolayers","authors":"Rui Huang , Yanzong Wang , Qinfang Zhang","doi":"10.1016/j.cocom.2025.e01109","DOIUrl":null,"url":null,"abstract":"<div><div>Janus structural engineering of two‐dimensional (2D) materials has emerged as a pivotal strategy for modulating their physicochemical properties. In this work, we designed new Janus MoSi<sub>2</sub>Z<sub>3</sub>X (Z/X = N, P, As) monolayers and systematically investigated their structural, electronic, carrier mobility, piezoelectric, and optical properties by first‐principles calculations. The results demonstrate that MoSi<sub>2</sub>P<sub>3</sub>N, MoSi<sub>2</sub>P<sub>3</sub>As, and MoSi<sub>2</sub>As<sub>3</sub>P monolayers exhibit robust dynamical, thermodynamic, and mechanical stability. The band structure reveals that MoSi<sub>2</sub>P<sub>3</sub>N (MoSi<sub>2</sub>P<sub>3</sub>As) is an indirect bandgap semiconductor with its valence band maximum (VBM) at the K (Γ) point and conduction band minimum (CBM) at the M (K) point, whereas MoSi<sub>2</sub>As<sub>3</sub>P is a direct bandgap semiconductor with both VBM and CBM located at the K point. Besides, biaxial strain engineering enables the phase transition from semiconductor-to-metal accompanied with an indirect‐to-direct bandgap transition in MoSi<sub>2</sub>P<sub>3</sub>N and a direct‐to-indirect transition in MoSi<sub>2</sub>As<sub>3</sub>P. Furthermore, these monolayers demonstrate anisotropic and high carrier mobility, especially the hole mobility of MoSi<sub>2</sub>P<sub>3</sub>N approaching 10<sup>3</sup> cm<sup>2</sup> V<sup>−1</sup> s<sup>−1</sup>. Specially, MoSi<sub>2</sub>P<sub>3</sub>N, MoSi<sub>2</sub>P<sub>3</sub>As, and MoSi<sub>2</sub>As<sub>3</sub>P monolayers exhibit excellent piezoelectric performance, especially, the piezoelectric strain coefficients <em>d</em><sub>11</sub> and <em>d</em><sub>31</sub> of MoSi<sub>2</sub>P<sub>3</sub>N are 6.61 and 0.12 pm/V, respectively. Furthermore, they display high optical absorption across both visible and ultraviolet spectral regions. These findings highlight the potential applications of Janus MoSi<sub>2</sub>Z<sub>3</sub>X monolayers in piezoelectric and photoelectric devices.</div></div>","PeriodicalId":46322,"journal":{"name":"Computational Condensed Matter","volume":"44 ","pages":"Article e01109"},"PeriodicalIF":3.9000,"publicationDate":"2025-08-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Computational Condensed Matter","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2352214325001091","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
引用次数: 0
Abstract
Janus structural engineering of two‐dimensional (2D) materials has emerged as a pivotal strategy for modulating their physicochemical properties. In this work, we designed new Janus MoSi2Z3X (Z/X = N, P, As) monolayers and systematically investigated their structural, electronic, carrier mobility, piezoelectric, and optical properties by first‐principles calculations. The results demonstrate that MoSi2P3N, MoSi2P3As, and MoSi2As3P monolayers exhibit robust dynamical, thermodynamic, and mechanical stability. The band structure reveals that MoSi2P3N (MoSi2P3As) is an indirect bandgap semiconductor with its valence band maximum (VBM) at the K (Γ) point and conduction band minimum (CBM) at the M (K) point, whereas MoSi2As3P is a direct bandgap semiconductor with both VBM and CBM located at the K point. Besides, biaxial strain engineering enables the phase transition from semiconductor-to-metal accompanied with an indirect‐to-direct bandgap transition in MoSi2P3N and a direct‐to-indirect transition in MoSi2As3P. Furthermore, these monolayers demonstrate anisotropic and high carrier mobility, especially the hole mobility of MoSi2P3N approaching 103 cm2 V−1 s−1. Specially, MoSi2P3N, MoSi2P3As, and MoSi2As3P monolayers exhibit excellent piezoelectric performance, especially, the piezoelectric strain coefficients d11 and d31 of MoSi2P3N are 6.61 and 0.12 pm/V, respectively. Furthermore, they display high optical absorption across both visible and ultraviolet spectral regions. These findings highlight the potential applications of Janus MoSi2Z3X monolayers in piezoelectric and photoelectric devices.