Thermomechanical modeling of bubble migration under local laser heating in van der Waals heterostructures

IF 0.9 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY
Soobeom Choi, Hyejeong Jeong, ChanSoo Kim, Hyungkook Choi, Myunglae Jo
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Abstract

Trapped interfacial bubbles in van der Waals (vdW) heterostructures degrade electronic performance but also present opportunities for local strain engineering. We develop a comprehensive thermomechanical model to investigate how localized continuous-wave (CW) laser heating can be used to manipulate such bubbles in hBN/graphene/hBN stacks. By integrating finite-difference heat conduction simulations with analytical models of bubble energetics, we quantify laser-induced temperature distributions and the conditions required for bubble migration. Our model incorporates optical absorption in both the encapsulated 2D layers and silicon substrate, vertical and lateral heat spreading, and interfacial thermal resistance. A temperature-based criterion for bubble migration is derived from the energy balance between internal pressure buildup and adhesion-limited motion. We show that focused laser power (40 mW) can raise local temperatures to 800 K, sufficient to overcome adhesion barriers for bubbles above a critical size. Notably, our analysis reveals that while the migration direction depends on a competition between internal pressure and adhesion energy gradients, the temperature dependence of adhesion typically dominates, driving bubbles toward colder regions under realistic conditions. These results offer a predictive framework for optothermal interface engineering, enabling spatially controlled bubble removal, cleanliness enhancement, and programmable strain in 2D material devices.

范德华异质结构局部激光加热下气泡迁移的热力学模拟
范德华(vdW)异质结构中被捕获的界面气泡会降低电子性能,但也为局部应变工程提供了机会。我们开发了一个综合的热力学模型来研究如何使用局部连续波(CW)激光加热来操纵hBN/石墨烯/hBN堆叠中的这些气泡。通过将有限差分热传导模拟与气泡能量分析模型相结合,我们量化了激光诱导的温度分布和气泡迁移所需的条件。我们的模型结合了封装二维层和硅衬底的光吸收、垂直和横向热扩散以及界面热阻。基于温度的气泡迁移准则是由内部压力积累和黏附限制运动之间的能量平衡导出的。我们表明,聚焦激光功率(40 mW)可以将局部温度提高到800 K,足以克服超过临界尺寸的气泡的粘附障碍。值得注意的是,我们的分析表明,虽然迁移方向取决于内部压力和粘附能梯度之间的竞争,但粘附的温度依赖性通常占主导地位,在现实条件下将气泡推向较冷的区域。这些结果为光热界面工程提供了一个预测框架,实现了二维材料器件中空间控制的气泡去除、清洁度增强和可编程应变。
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来源期刊
Journal of the Korean Physical Society
Journal of the Korean Physical Society PHYSICS, MULTIDISCIPLINARY-
CiteScore
1.20
自引率
16.70%
发文量
276
审稿时长
5.5 months
期刊介绍: The Journal of the Korean Physical Society (JKPS) covers all fields of physics spanning from statistical physics and condensed matter physics to particle physics. The manuscript to be published in JKPS is required to hold the originality, significance, and recent completeness. The journal is composed of Full paper, Letters, and Brief sections. In addition, featured articles with outstanding results are selected by the Editorial board and introduced in the online version. For emphasis on aspect of international journal, several world-distinguished researchers join the Editorial board. High quality of papers may be express-published when it is recommended or requested.
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